1. Temperature dependent transport studies in InN quantum dots grown by droplet epitaxy on silicon nitride/Si substrate.
- Author
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Kumar, Mahesh, Roul, Basanta, Shetty, Arjun, Rajpalke, Mohana K., Bhat, Thirumaleshwara N., Kalghatgi, A. T., and Krupanidhi, S. B.
- Subjects
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QUANTUM dots , *SILICON nitride , *TRANSMISSION electron microscopy , *CHEMICAL bonds , *SEMICONDUCTOR-metal boundaries , *ELECTRODES - Abstract
InN quantum dots (QDs) were fabricated on silicon nitride/Si (111) substrate by droplet epitaxy. Single-crystalline structure of InN QDs was verified by transmission electron microscopy, and the chemical bonding configurations of InN QDs were examined by x-ray photoelectron spectroscopy. Photoluminescence measurement shows a slight blue shift compared to the bulk InN, arising from size dependent quantum confinement effect. The interdigitated electrode pattern was created and current-voltage (I-V) characteristics of InN QDs were studied in a metal-semiconductor-metal configuration in the temperature range of 80-300 K. The I-V characteristics of lateral grown InN QDs were explained by using the trap model. [ABSTRACT FROM AUTHOR]
- Published
- 2011
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