1. Chemical instability of graphene oxide following exposure to highly reactive radicals in advanced oxidation processes.
- Author
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Wang, Zhaohui, Sun, Linyan, Lou, Xiaoyi, Yang, Fei, Feng, Min, and Liu, Jianshe
- Subjects
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GRAPHENE oxide , *CHEMICAL stability , *HYDROXYL group , *X-ray photoelectron spectroscopy , *TRANSMISSION electron microscopy - Abstract
The rapidly increasing and widespread use of graphene oxide (GO) as catalyst supports, requires further understanding of its chemical stability in advanced oxidation processes (AOPs). In this study, UV/H 2 O 2 and UV/persulfate (UV/PS) processes were selected to test the chemical instability of GO in terms of their performance in producing highly reactive hydroxyl radicals ( OH) and sulfate radicals (SO 4 − ), respectively. The degradation intermediates were characterized using UV–visible absorption spectra (UV–vis), X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM), Raman spectroscopy, and matrix-assisted laser desorption and ionization time-of-flight mass spectrometry (MALDI-TOF-MS). Experimental data indicate that UV/PS process was more effective in enhancing GO degradation than the UV/H 2 O 2 system. The overall oxygen-containing functionalities (e.g. C O, C O and O C O groups) dramatically declined. After radical attack, sheet-like GO was destructed into lots of flakes and some low-molecular-weight molecules were detected. The results suggest GO is most vulnerable against SO 4 − radical attack, which deserves special attention while GO acts as a catalyst support or even as a catalyst itself. Therefore, stability of GO and its derivatives should be carefully assessed before they are applied to SO 4 − -based AOPs. [ABSTRACT FROM AUTHOR]
- Published
- 2017
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