1. Enhancing oxidation resistance of Mo metal substrate by sputtering an MoSi2(N) interlayer as diffusion barrier of MoSi2(Si) surface coating.
- Author
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Li, Fengji, Yu, Xiuhan, Shi, Xunwang, Sun, Deen, Du, Hongji, Shao, Yong, Wang, Jinbiao, and Zhang, Sam
- Subjects
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DIFFUSION barriers , *SURFACE coatings , *MOLYBDENUM disilicide , *FIELD emission electron microscopy - Abstract
Owing to the diffusion of Si elements towards the metal substrate and the "pesting" behavior caused by volatilization of MoO 3 , magnetron-sputtered MoSi 2 coating is highly susceptible to failure and unable to protect the metal substrate from oxidation. In this work, therefore, an MoSi 2 (N) interlayer was sputtered on Mo substrates as the diffusion barrier, followed by deposition of Si-doped MoSi 2 (i.e., MoSi 2 (Si)) layer to suppress the "pesting" behavior. The as-deposited coatings were annealed subsequently at 1000 °C in an Ar atmosphere to obtain a stable structure. To evaluate the oxidation resistance, the annealed coating was heated in a muffle furnace in air at 700 °C, 1000 °C and 1200 °C for different durations. The coating structure, surface morphology, cross section and chemical composition were examined by X-ray diffraction, field emission scanning electron microscopy, and energy dispersive spectroscopy. The results showed the MoSi 2 (N) interlayer was amorphous and kept the most stable thermal stability at Ar/N 2 flow rate of 20/20 sccm. It effectively blocked the downward diffusion of Si. Free state Si elements only diffused towards the coating surface. "Pesting" pores in the MoSi 2 (Si) layer were repaired by the growth of SiO 2 layer via the preferential oxidation of Si. The mechanism for the enhanced oxidation resistance was explained through a model. • Amorphous MoSi 2 (N) interlayer is an effective diffusion barrier. • MoSi 2 (N) interlayer blocks diffusion of Si elements in MoSi 2 (Si) coating to enhance oxidation resistance of Mo substrate. • "Pesting" pores are repaired by growth of SiO 2 layer via oxidation of Si. [ABSTRACT FROM AUTHOR]
- Published
- 2023
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