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The defect-induced laser damage on mechanically machined fused silica optical surfaces under intense laser irradiation severely threatens the laser damage resistance of optical components. The lack of a quantitative relationship between the feature information of surface defects and the laser-induced damage thresholds (LIDTs) of optical surfaces poses a challenge to effectively evaluate the influence of the surface defects on the LIDTs of optical surfaces. Herein, the photoluminescence (PL) properties of the areas where laser damage tends to occur in surface-defect zones are explored. The PL induced by the point defects at the atomic scale in these areas is found to be obviously higher than that of other positions. The PL envelope area (S) at the position with the highest PL intensity among the whole surface defect is found to be inversely proportional to the LIDT (Φ) of the optical surface for the first time (SΦ = N 0). It is beneficial to quantitatively characterize the influence of the surface defect and provide new insights in elucidating the defect-induced laser damage mechanisms. Besides, we found that there is a minimum LIDT for the mechanically machined optical surfaces with various surface defects. On basis of this, the maximum influence of the surface defects with different species on the LIDTs of optical surfaces could be determined. Based on the constructed relationship (SΦ = N 0) and the developed MD model, two causes of the minimum LIDT are determined. The PL envelope area of the surface defect would slightly affect the LIDT when the PL envelope area is large enough, which is the first cause. The mechanical force could compact the optical surface, increasing the densities of Si and O atoms. However, the densities of Si and O atoms become stable when the mechanical force is large enough, causing the highest densities of point defects, which is the second cause. [ABSTRACT FROM AUTHOR]

[Display omitted] • There are amounts of point defects at the atomic scale in the residual stress zones. • The STE point defects at the atomic scale distributed on the fused silica surface are found to be closely related to the residual stress on the fused silica surface for the first time. • PL-detection method is proposed to characterize the residual stress on the material surface for the first time. • The relative amount of STE point defect (K = S / S 0) is first proposed to quantitatively characterize the residual stress. The residual stress would have a significant impact on the service performance and fatigue life of the fused silica (non-crystal material) components (e.g., Hemispherical Shell Resonator). However, there is still no effective method for characterizing the residual stress on their working surfaces. Therefore, it is essential to develop a novel method for characterizing the residual stress on fused silica surfaces. Herein, the residual stress is found to significantly affect the mechanical properties of fused silica surfaces. On the basis of the study on the photoluminescence (PL) properties of residual stress zones, atomic point defects are found to be closely related to the residual stress. Based on an investigation of the PL properties of different types of mechanically processed surfaces, four types of point defects (ODCII, STE, Si clusters and NBOHCI) have been determined. On the basis of the molecular dynamics (MD) simulation results and the PL experiments on different types of mechanically processed surfaces, STE point defects at the atomic scale are found to be closely related to the residual stress for the first time. Based on this, PL-detection method is proposed to characterize the residual stress on the material surface for the first time. Besides, the relative amount of STE point defect (K = S/S 0) is first proposed to quantitatively characterize the residual stress. In sum, this work determines the structure at the atomic scale which is closely related to the residual stress and opens a convenient door to quantitatively characterize the residual stress with PL-detection method. It could also provide a reference for the characterization and even the alleviation of the residual stress on the surfaces of other non-crystal materials. [ABSTRACT FROM AUTHOR]