1. MBE growth and interfaces characterizations of strained HgTe/CdTe topological insulators.
- Author
-
Thomas, C., Baudry, X., Barnes, J.P., Veillerot, M., Jouneau, P.H., Pouget, S., Crauste, O., Meunier, T., Lévy, L.P., and Ballet, P.
- Subjects
- *
MOLECULAR beam epitaxy , *MERCURY telluride , *CADMIUM telluride , *TOPOLOGICAL insulators , *X-ray diffraction , *SCANNING transmission electron microscopy - Abstract
Topological insulator materials like HgTe exhibit unique electronic properties at their interfaces and so peculiar attention has to be paid concerning the growth optimization. Molecular beam epitaxy of tensile-strained HgTe/CdTe is investigated as a function of the growth temperature. Crystal quality is checked by using high resolution X-rays diffraction. By combining several material characterization techniques such as scanning transmission electronic microscopy, time-of-flight secondary ion mass spectroscopy and X-rays reflectivity, we report sharp interface morphology with nanometer-scale Hg/Cd diffusion lengths. [ABSTRACT FROM AUTHOR]
- Published
- 2015
- Full Text
- View/download PDF