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A new ultramicrohardness tester for a load range between 2×10-2 and 5×10-5 N is described. The instrument is operated inside a scanning electron microscope. Load is applied and measured by means of electrical signals thus making fully automized experiments possible. Typical examples demonstrate the capability of the device and the general problem associated with ultra-low-load hardness testing. With experiments on thin films the complex situation for testing layered structures is shown and suggestions for a proper evaluation are given. [ABSTRACT FROM AUTHOR]