1. Dual-mode snapshot interferometric system for on-machine metrology.
- Author
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Xiaobo Tian, Yu Zhang, Sohn, Alexander, Spires, Oliver J., and Rongguang Liang
- Subjects
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METROLOGY , *PHASE-shifting interferometry , *DIAMOND turning , *PHOTOGRAPHS , *INTERFEROMETERS , *INTERFERENCE microscopy , *SURFACE roughness - Abstract
For the first time, we present a dual-mode snapshot interferometric system for measuring both surface shape and surface roughness to meet the need for on-machine metrology in optical fabrication. Two different modes, interferometer mode and interference microscopy mode, are achieved using Linnik configuration. To realize snapshot measurement, a pixelated polarization camera is used to capture four phase-shifted interferograms simultaneously. We have demonstrated its performance for off-line metrology and on-machine metrology by mounting it on a diamond turning machine. [ABSTRACT FROM AUTHOR]
- Published
- 2019
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