Search

The laser ablation threshold is an important parameter that governs the response of materials to intense laser irradiation. Here we study the ablation threshold of liquid tin, by irradiating tin microdroplets with nanosecond laser pulses having finely controlled temporal shape and duration. We use the time-dependent reflection from the droplet as the main observable, which exhibits a sharp decrease in magnitude at a given time instance that depends on the laser intensity. This moment marks the generation of a plasma that strongly absorbs the following incident laser light, rapidly expands, and thereby sets in motion the remainder of the liquid droplet. We find an inverse-square dependence of this plasma-onset time on laser intensity and attribute this scaling to the presence of one-dimensional heat diffusion during irradiation. This scaling and its one-dimensional thermal origin is strongly established in literature and follows from a square-root scaling of the thermal diffusion depth with time. Our experiment unambiguously shows that this scaling law holds for our specific case of nanosecond laser impact on tin microdroplets. The results presented in this work are of particular interest to target preparation and metrology in extreme-ultraviolet sources utilizing tin microdroplet targets. [ABSTRACT FROM AUTHOR]

We present a calibrated spectrum in the 5.5–265.5 nm range from a microdroplet-tin Nd:YAG-laser-produced plasma under conditions relevant for the production of extreme ultraviolet (EUV) light at 13.5 nm for nanolithography. The plasma emission spectrum obtained using a custom-built transmission grating spectrometer results from a careful calibration of a series of filters enabling measurements free of any higher diffraction orders. Specifically, Zr, Si, and Al thin-foil filters and bulk LiF, MgF2, and UV fused silica filters are employed. A further filter using four SiC mirrors is used to record the otherwise inaccessible 40–100 nm range. The resulting corrected and concatenated spectra are shown to accurately match in their respective overlap regions. The possibility to measure spectra over this broad range enables the optimization of current and future sources of EUV light for nanolithography by providing the diagnostics required for minimizing the emission of unwanted wavelength bands. [ABSTRACT FROM AUTHOR]

The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme ultraviolet (EUV) regime. In a two-pulse scheme, a pre-pulse laser is first used to deform tin microdroplets into thin, extended disks before the main (2 µm) pulse creates the EUV-emitting plasma. Irradiating 30- to 300 µm-diameter targets with 2 µm laser pulses, we find that the efficiency in creating EUV light around 13.5 nm follows the fraction of laser light that overlaps with the target. Next, the effects of a change in 2 µm drive laser intensity (0.6–1.8 × 1011 W cm−2) and pulse duration (3.7–7.4 ns) are studied. It is found that the angular dependence of the emission of light within a 2% bandwidth around 13.5 nm and within the backward 2π hemisphere around the incoming laser beam is almost independent of intensity and duration of the 2 µm drive laser. With increasing target diameter, the emission in this 2% bandwidth becomes increasingly anisotropic, with a greater fraction of light being emitted into the hemisphere of the incoming laser beam. For direct comparison, a similar set of experiments is performed with a 1 µm-wavelength drive laser. Emission spectra, recorded in a 5.5–25.5 nm wavelength range, show significant self-absorption of light around 13.5 nm in the 1 µm case, while in the 2 µm case only an opacity-related broadening of the spectral feature at 13.5 nm is observed. This work demonstrates the enhanced capabilities and performance of 2 µm-driven plasmas produced from disk targets when compared to 1 µm-driven plasmas, providing strong motivation for the use of 2 µm lasers as drive lasers in future high-power sources of EUV light. [ABSTRACT FROM AUTHOR]

Antihydrogen atoms are produced at CERN in highly excited Rydberg states. However, precision measurements require anti-atoms in ground state. Whereas experiments currently rely on spontaneous emission only, simulations have shown that THz light can be used to stimulate the decay towards ground state and thus increase the number of anti-atoms available for measurements. We review different possibilities at hand to generate light in the THz range required for the purpose of stimulated deexcitation. We demonstrate the effect of a blackbody type light source, which however presents drawbacks for this application including strong photoionization. Further, we report on the first THz transitions in a beam of Rydberg caesium atoms induced by photomixers and conclude with the implications of the results for the antihydrogen case. [ABSTRACT FROM AUTHOR]