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1. Growth and characteristics of tantalum oxide thin films deposited using thermionic vacuum arc technology

Author

Vladoiu, Rodica, Ciupina, Victor, Mandes, Aurelia, Dinca, Virginia, Prodan, Madalina, and Musa, Geavit

Subjects
Chemical synthesis -- Analysis, Physics
Abstract

The thermionic vacuum arc technology is employed to explain the synthesis, as well as the properties of the various tantalum oxide thin films. The film are shown to exhibit a smooth distribution of the nanoparticles with a diameter in the range of 3-6 nm.

Published
2010

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