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The formation of polymeric micro-patterns on various substrates via a photolithography procedure has been widely used in semiconductor fabrication. Standard polymer patterns are usually fabricated via photosensitive polymer varnishes, in which large amounts of potentially harmful solvents with weight ratios over 50 wt% have to be removed. In the current work, a novel pattern-formation methodology via solvent-free electrospun photosensitive polymeric fibrous membranes (NFMs) instead of the conventional photosensitive solutions as the starting photoresists was proposed and practiced. For this purpose, a series of preimidized negative auto-photosensitive polyimide (PSPI) resins were first prepared via the two-step chemical imidization procedure from the copolymerization reactions of 3,3',4,4'-benzophenonetetracarboxylic- dianhydride (BTDA) and two ortho -methyl-substituted aromatic diamines, including 3,3',5,5'-tetramethyl-4,4'-diaminodiphenylmethane (TMMDA) and 3,7-diamino-2,8-dimethyl- dibenzothiophene sulfone (TSN). The derived homopolymer PI-1 (BTDA-TMMDA) and the copolymers, including SPI-2~SPI-6, with the molar ratio of 5~25% for TSN in the diamine units, showed good solubility in polar solvents. Then, a series of PSPI NFMs were fabricated via standard electrospinning procedure with the developed PSPI solutions in N,N -dimethylacetamide (DMAc) with a solid content of 25 wt% as the starting materials. The derived PSPI NFMs showed good thermal stability with 5% weight loss temperatures higher than 500 °C in nitrogen. Meanwhile, the derived PSPIs showed good photosensitivity to the ultraviolet (UV) emitting wavelengths of i-line (365 nm), g-line (405 nm) and h-line (436 nm) of the high-pressure mercury lamps in both forms of transparent films and opaque NFMs. Fine micro-patterns with a line width of around 100 μm were directly obtained from the representative SPI-4 NFM via standard photolithography procedure.

Optically transparent polymer films with excellent thermal and ultraviolet (UV) resistance have been highly desired in advanced optoelectronic fields, such as flexible substrates for photovoltaic devices. Colorless and transparent polyimide (CPI) films simultaneously possess the good thermal stability and optical transparency. However, conventional CPI films usually suffered from the UV exposure and have to face the deterioration of optical properties during the long-term service in UV environments. In the current work, the commercially available hindered amine light stabilizers (HALS) were tried to be incorporated into the semi-alicyclic CPI matrix with the aim of enhancing the UV exposure stability. For this target, a CPI-0 film was first prepared from hydrogenated pyromellitic dianhydride (HPMDA) and 2,2'-dimethylbenzidine (DMBZ) via a one-step polycondensation procedure. Then, the commercially available HALS were incorporated into the CPI-0 (HPMDA-DMBZ) film matrix to afford four series of CPI/HALS composite films. Experimental results indicated that the Tinuvin ® 791 HALS showed the best miscibility with the CPI-0 film matrix and the derived CPI-D series of composite films exhibited the best optical transmittances. The CPI-D nanocomposite films showed apparently enhanced UV exposure stability via incorporation of the 791 additives. For the pristine CPI-0 film, after the UV exposure for 6 h, the optical properties, including the transmittance at the wavelength of 350 nm ( T 350 ), lightness ( L *), yellow indices ( b *), and haze obviously deteriorated with the T 350 values from 55.7% to 17.5%, the L * values from 95.12 to 91.38, the b * values from 3.38 to 21.95, and the haze values from 1.46% to 9.33%. However, for the CPI-D-10 film (791: CPI-0 = 1.0 wt%, weight percent), the optical parameters were highly maintained with the T 350 values from 61.4% to 53.8%, the L * values from 95.46 to 95.36, the b * values from 1.84 to 1.51, and the haze values from 0.69% to 3.34% under the same UV aging conditions.

Nitraria sibirica usually exists in a form of nebkhas, and has strong ecological adaptability. The plant species has distinctive function for wind prevention and sand fixation, and resistance drought and salt. However, the water condition is still a limiting factor for the plant survival and development. In order to understand the water use strategy of the plant in different desert habitats, we selected the N. sibirica growing in sandy desert habitat and gravel desert habitat to study the seaso-nal variation of plant water sources and response to precipitation at the edge of the oasis of Linze in the Hexi Corridor. We measured the oxygen stable isotope of the plant stem water and the different potential water sources (precipitation, soil water and ground water), and used the IsoSource model to calculate the proportion of water sources from the potential water. The results showed that there were significant seasonal variation characteristics of δ 18 O value and water source of stem water for the plant in the two habitats. In the sandy habitat, the plant used more ground water in the less precipitation seasons including spring and fall, and more than 50% of the water sources absorbed from ground water. However, under the condition of gravel habitat, the plant could not achieve the ground water level depth of 11.5 m, and its water source was controlled by precipitation, which had large seasonal variability. The water sources of N. sibirica had significant responses to the change of precipitation in the two desert habitats. Following the rapid decrease of soil water content after the precipitation events, the plant in the sandy habitat turned to use the abundant ground water as the main sources of water, while the plant in the gravel habitat only used the less water from precipita-tion infiltration to the deep soil. Therefore, different water use strategies of the plant in the two habitats were the main reason for the difference in growth characteristics, and it had a strong ability of self-adjustment and adaptation.