Zheng, WT, Guo, JH, Sakamoto, Y, Takaya, M, Li, XT, Chao, PJ, Jin, ZS, Xing, KZ, Sundgren, JE, Zheng, WT, Guo, JH, Sakamoto, Y, Takaya, M, Li, XT, Chao, PJ, Jin, ZS, Xing, KZ, and Sundgren, JE
Carbon nitride films are deposited using dc magnetron sputtering in a N-2 discharge. The nature of chemical bonding of the films is investigated using X-ray photoelectron spectroscopy, near-edge X-ray absorption fine structure, and X-ray emission spectros, Addresses: Zheng WT, Jilin Univ, Dept Mat Sci, Changchun 130023, Peoples R China. Jilin Univ, Dept Mat Sci, Changchun 130023, Peoples R China. Jilin Univ, Natl Key Lab Superhard Mat, Changchun 130023, Peoples R China. Chiba Inst Technol, Dept Precis Engn