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Neighbor designs are popular to control neighbor effects. Among neighbor designs, strongly balanced neighbor designs are important to estimate treatment effects and neighbor effects independently. Minimal circular strongly balanced neighbor designs (MCSBNDs) can be obtained only for odd v (number of treatments). For v even, minimal circular nearly strongly balanced neighbor designs are used which satisfied all conditions of MCSBNDs except that the treatment labeled as (v − 1) does not appear as its own neighbor. These designs can be converted directly in some other useful classes of neighbor designs. These designs are efficient to minimize the bias due to the neighbor effects.

Optically addressable spin defects in silicon carbide (SiC) are an emerging platform for quantum information processing. Lending themselves to modern semiconductor nanofabrication, they promise scalable high-efficiency spin-photon interfaces. We demonstrate here nanoscale fabrication of silicon vacancy centres (VSi) in 4H-SiC without deterioration of their intrinsic spin-optical properties. In particular, we show nearly transform limited photon emission and record spin coherence times for single defects generated via ion implantation and in triangular cross section waveguides. For the latter, we show further controlled operations on nearby nuclear spin qubits, which is crucial for fault-tolerant quantum information distribution based on cavity quantum electrodynamics.

We demonstrate on-axis homoepitaxial growth of 4H-SiC(0001) PiN structure on 3-inch wafers with 100% 4H polytype in the epilayer excluding the edges. The layers were grown with a thickness of 105 μm and controlled n-type doping of 4 x 1014 cm-3.The epilayers were completely free of basal plane dislocations, in-grown stacking faults and other epitaxial defects, as required for 10 kV high power bipolar devices. Some part of the wafer had a lifetime enhancement procedure to increase lifetime to above 2 μs using carbon implantation. An additional step of epilayer polishing was adapted to reduce surface roughness and implantation damage., QC 20130829