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AimThe association between gamma-glutamyl transferase (GGT) and type 2 diabetes mellitus (T2DM) is controversial. In this study, we investigated the association between GGT and the risk of T2DM using real-world data, Mendelian randomization (MR) analysis, and literature mining.MethodsA cross-sectional study enrolled 3,048 participants (>40 years) from a community in Northeastern China was conducted. A generalized additive model was used to examine the relation between GGT and T2DM. A two-sample MR was performed to investigate the causal effect of GGT (61,089 individuals, mostly of European ancestry) on T2DM (29,193 cases and 182,573 controls of European ancestry).ResultsGGT was related to glucose metabolism indicators, such as fasting plasma glucose and glycosylated hemoglobin (P < 0.05). The odds ratios (ORs) [95% confidence interval (95% CI), P] for T2DM across the GGT categories (14–16, 17–20, 21–25, 26–35, ≥36) were 1.14 [(0.88-1.47), P = 0.330], 1.55 [(1.22-1.98), P < 0.001], 1.87 [(1.47-2.28), P < 0.001], 1.97 [(1.55-2.52), P < 0.001], and 2.29 [(1.78-2.94), P < 0.001] versus GGT ≤ 13 category after adjusting for potential confounding factors. A generalized additive model identified a non-linear correlation between GGT and T2DM and indicated that the risk of T2DM almost levelled out when GGT exceeded 34 IU/L. The MR analysis showed that the odds of having T2DM for a one-time increase in genetically determined GGT was 0.998 [(0.995-1.002), P = 0.34].ConclusionsOur analysis of observational study suggested that GGT, its increment, within a certain range, is indicative of the development of T2DM. However, MR analysis provided no evidence that GGT is a linear causal factor of T2DM. Further investigation is required to determine if GGT exerts a non-linear causal effect on T2DM.

Graphene oxide (GO) nanosheets were used as adsorbent material for the removal of clofibric acid (CA) which was difficult to be removed from wastewater by traditional wastewater treatment technique. Adsorption kinetics, adsorption equilibrium, and effect of pH, ionic strength, and humic acid (HA) of the adsorption of CA onto the GO nanosheets in aqueous solution were investigated in detail. Adsorption isotherm studies indicated that the Langmuir isotherm equation fitted the sorption isotherm data better than Freundlich model and the maximum adsorption capacity of GO nanosheets for CA was 994 mg g−1. In addition, adsorption kinetics data showed that the sorption of CA on GO nanosheets reached equilibration within a few minutes and were well fitted by pseudo second-order model. The results of the effects of environment factors indicated that CA sorption on GO nanosheets was weakly affected by ionic strength and strongly depended on pH and HA because of the structure of CA and the large number of oxygen-containing function groups presented on the surface of GO nanosheets. Besides, the removal efficiency of GO nanosheets for CA was reduced at pH >4 and enhanced at pH

The layer-by-layer molecular-level manipulation of ionic polymer have been utilized to fabricate ultrathin multilayer films (SAMp). In this process, monolayers of polycations and polyanions are sequentially adsorbed onto a substrate surface by alternately dipping the substrate into aqueous solutions of poly(vinylamine) backbone azo (PDYE), poly(sodium 4-styrenesulfonate) (PSS), and poly(al1ylamine hydrochloride) (PAH). The ionic attractions developed between the oppositely charged polymers promote strong interlayer adhesion and a uniform and linear multilayer deposition process. UV/Vis absorbance, contact angle, and ellipsometry measurements revealed that in all cases the bilayer deposition process was linear and highly producible from layer to layer and film thickness of up to 1 µm can be easily obtained by repeating the deposition process. The typical thickness of bilayer film depend on the solution concentration. Contact angle and UV/Vis spectroscopy measurements demonstrated that the deposition time for a full monolayer coverage of azo dye and PAH was about 20 seconds. Our results showed that the mechanical stability of these SAMp films was remarkable, and SAMp films can only be removed from the substrate by scraping. SAMp films are stable in the common organic solvents and even in the high acidic media (6M HCl aqueous solution). The conformation of these films are thermally stable at high temperature. In an attempt to develop patterned surfaces of sulfonate and thiol functionality, close-packed, well-ordered (3-mercaptopropyl)trimethoxysilane (MPS) monolayer were formed on the surfaces of single crystal silicon, quartz, and glass by allowing hydrolyzed silane to self-assemble from a dilute hydrocarbon solution. The films of MPS were irradiated with an ozone-producing UV light source results in efficient conversion of the surface-localized thiol groups to sulfonated groups, a complete photo-oxidation of the thiol surface was obtained and characterized by x-ray photoelectron spectroscopy (XPS) and contact angle measurements. Sulfonated self-assembled films can be used as good organic templates for the deposition of SAMp films and for micropatterning of organic surfaces based on our results. Such results significantly extend the application of SAMp films since the sulfonate-functionalized surface can be introduced into the surfaces of aromatic polymers, metals, ceramics, semiconductors, and plastics. So that the process of SAMp deposition can be carried out onto many different substrate surfaces. The novel self-assembly technique combined with photolithography was used to develop three different methods of micropatterning fabrication in an attempt to achieve the goal of full-color flat-panel display. The characteristic of distinguishing our methods from the existed ones is that the patterning is done first and then the vertical multilayers were built-up on the patterned areas. Moreover, in this process, SAMp films were used as active species. Scanning Electron Microscopy (SEM) was employed to confirm the patterning technique. In order to block the further growth of the second film type on the sites of first film type, several molecules with inert function groups were tried. UV/Vis absorbance and contact angle measurements revealed that dodecyltrimethylammonium bromide (DTAB) atop the PAH/PSS SAMp film could prevent further adsorption of the ionic polymers. Ph. D.

Background: Although hypomethylating agents are currently used to treat patients with cancer, whether they can also reactivate and up-regulate oncogenes is not well elucidated. Methods: We examined the effect of hypomethylating agents on SALL4, a known oncogene that plays an important role in myelodysplastic syndrome and other cancers. Paired bone marrow samples that were obtained from two cohorts of patients with myelodysplastic syndrome before and after treatment with a hypomethylating agent were used to explore the relationships among changes in SALL4 expression, treatment response, and clinical outcome. Leukemic cell lines with low or undetectable SALL4 expression were used to study the relationship between SALL4 methylation and expression. A locus-specific demethylation technology, CRISPR-DNMT1-interacting RNA (CRISPR-DiR), was used to identify the CpG island that is critical for SALL4 expression. Results: SALL4 up-regulation after treatment with hypomethylating agents was observed in 10 of 25 patients (40%) in cohort 1 and in 13 of 43 patients (30%) in cohort 2 and was associated with a worse outcome. Using CRISPR-DiR, we discovered that demethylation of a CpG island within the 5' untranslated region was critical for SALL4 expression. In cell lines and patients, we confirmed that treatment with a hypomethylating agent led to demethylation of the same CpG region and up-regulation of SALL4 expression. Conclusions: By combining analysis of patient samples with CRISPR-DiR technology, we found that demethylation and up-regulation of an oncogene after treatment with a hypomethylating agent can indeed occur and should be further studied. (Funded by Associazione Italiana per la Ricerca sul Cancro and others.).

A patterned molecular self-assembly is provided. The patterned molecular self-assembly comprises a support having an exposed patterned surface and a non-patterned surface. A compound is selectively adsorbed on the exposed patterned surface. The compound may comprise a first compound selectively adsorbed on the exposed patterned surface and a second compound selectively adsorbed on the first compound to form at least one bilayer. The patterned molecular self-assembly may further comprise a first set of bilayers and a second set of bilayers wherein the first set of bilayers has a different composition than the second set of bilayers.

An electrostatic self-assembly method of fabricating electrostrictive and piezoelectric thin film assemblies not only provides a thinner film than is attainable by conventional methods, but provides excellent molecular-level uniformity and precise structural control, and thus large, effective piezoelectric coefficients. The method produces a thin film assembly including (a) a substrate, and (b) a film having one or a plurality of layers disposed upon the substrate, wherein at least one of the layers includes a dipolar material, and this layer of dipolar material has a uniform thickness of at most 500 nm.

A patterned molecular self-assembly is provided. The patterned molecular self-assembly comprises a support having an exposed patterned surface and a non-patterned surface. A compound is selectively adsorbed on the exposed patterned surface. The compound may comprise a first compound selectively adsorbed on the exposed patterned surface and a second compound selectively adsorbed on the first compound to form at least one bilayer. The patterned molecular self-assembly may further comprise a first set of bilayers and a second set of bilayers wherein the first set of bilayers has a different composition than the second set of bilayers.