Search

The effect of ion energy in a focused ion beam in the range 12-30 keV on the formation depth of nonradiative recombination centers during etching of the Al0.18Ga0.82As/GaAs/Al0.18Ga0.82As double heterostructure has been studied. It is shown that an increase in the ion energy leads to an increase in the concentration and propagation depth of radiation defects. It was found that during etching of focused ion beam with ion energies above 15 keV, the depth of formation of radiation defects exceeds 900 nm, which does not correspond to the calculations in the Stopping and Range of Ions in Matter. Keywords: focused ion beam, radiation defects, photoluminescence, annealing, AlGaAs/GaAs.

We studied the influence of the focused ion beam milling of ridge waveguides on lasing parameters of edge-emitting lasers, based on a separate confinement double heterostructure. It is shown that there are three degrees of influence, according to the etching depth: modification of the waveguide properties only, a decrease in efficiency without changing the threshold current, and a simultaneous deterioration in the threshold current and efficiency with significant modification of the optical characteristics of the laser. Keywords: focused ion beam, semiconductor laser, optical waveguide, single mode lasing.

The paper presents a procedure for creating on GaAs(100) substrates textured surfaces by ion-beam etching with a focused beam. The possibility of flexibly controlling the shape and profile of the formed submicron elements of textured media is shown; this will later allow formation of textured surfaces of almost any complexity for realizing the surface radiation coupling from the waveguide. Original lithographic masks were developed, and 3D lithography was accomplished. The obtained lithographic patterns were controlled by the methods of optical, electron and atomic force microscopy. Keywords: ion-beam etching, metasurface, textured surface, lithography, surface coupling of radiation.