1. Numerical analysis of the non-equilibrium plasma flow in the gaseous electronics conference reference reactor
- Author
-
Yang Bijie, Sun Quanhua, and Zhou Ning
- Subjects
010302 applied physics ,Chemistry ,02 engineering and technology ,Plasma ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,Electronic, Optical and Magnetic Materials ,Chamber pressure ,Volumetric flow rate ,Ion ,Collision frequency ,Physics::Plasma Physics ,Torr ,0103 physical sciences ,Materials Chemistry ,Capacitively coupled plasma ,Electrical and Electronic Engineering ,Atomic physics ,0210 nano-technology ,Low voltage - Abstract
The capacitively coupled plasma in the gaseous electronics conference reference reactor is numerically investigated for argon flow using a non-equilibrium plasma fluid model. The finite rate chemistry is adopted for the chemical non-equilibrium among species including neutral metastable, whereas a two-temperature model is employed to resolve the thermal non-equilibrium between electrons and heavy species. The predicted plasma density agrees very well with experimental data for the validation case. A strong thermal non-equilibrium is observed between heavy particles and electrons due to its low collision frequency, where the heavy species remains near ambient temperature for low pressure and low voltage conditions (0.1 Torr, 100 V). The effects of the operating parameters on the ion flux are also investigated, including the electrode voltage, chamber pressure, and gas flow rate. It is found that the ion flux can be increased by either elevating the electrode voltage or lowering the gas pressure.
- Published
- 2016