33 results on '"Hubička, Z."'
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2. Tailoring properties of indium tin oxide thin films for their work in both electrochemical and optical label-free sensing systems
3. Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
4. WO3 and WO3-x thin films prepared by DC hollow cathode discharge
5. High rate deposition of photoactive TiO2 films by hot hollow cathode
6. α-Fe2O3/TiO2 stratified photoanodes
7. Fe-Ti alloy layer plasma deposition – Monitoring of plasma parameters and properties of deposited alloys, anodization and photoelectrochemical characterization
8. On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method
9. Epoxy catalyzed sol–gel method for pinhole-free pyrite FeS2 thin films
10. High-power pulsed plasma deposition of hematite photoanode for PEC water splitting
11. ZnO thin films prepared by surfatron produced discharge
12. Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system
13. Deposition of PZT thin film onto copper-coated polymer films by mean of pulsed-DC and RF-reactive sputtering
14. Photoelectrochemical properties of hierarchical nanocomposite structure: Carbon nanofibers/TiO 2/ZnO thin films
15. Notes on the photo-induced characteristics of transition metal-doped and undoped titanium dioxide thin films
16. Double hollow cathode plasma jet-low temperature method for the TiO 2− xN x photoresponding films
17. Photo-induced electrochemical functionality of the TiO 2 nanoscale films
18. Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system
19. Advanced methods for titanium (IV) oxide thin functional coatings
20. Time-resolved probe diagnostics of pulsed DC magnetron discharge during deposition of TiOx layers
21. Plasma diagnostics in the pulse magnetron sputtering system used for deposition Ti-C:H thin films
22. Composition of Ti-C:H films obtained by pulsed and continuous magnetron sputtering
23. Investigation of the RF pulse modulated plasma jet system during the deposition of Pb(ZrxTi1−x)O3 thin films on polymer substrates
24. Investigation of the low temperature atmospheric deposition of TCO thin films on polymer substrates
25. Deposition of high quality amorphous silicon, germanium and silicon-germanium thin films by a hollow cathode reactive sputtering system
26. Investigation of the RF plasma jet system for deposition of LiCoO x thin films
27. Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films
28. Deposition of In xO y and SnO x thin films on polymer substrate by means of atmospheric barrier-torch discharge
29. Investigation of the atmospheric RF torch-barrier plasma jet for deposition of CeO x thin films
30. Investigation of the rf and dc hollow cathode plasma-jet sputtering systems for the deposition of silicon thin films
31. Low-pressure RF multi-plasma-jet system for deposition of alloy and composite thin films
32. CN x coatings deposited by pulsed RF supersonic plasma jet: hardness, nitrogenation and optical properties
33. Cu 3N films prepared by the low-pressure r.f. supersonic plasma jet reactor: Structure and optical properties
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