18 results on '"Wang, Tongqing"'
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2. Publisher Correction to: Computational investigation of a novel metal thickness measurement system with coaxial triple‑coil sensor for chemical mechanical polishing
3. Synthesis of CeO2 Nanoparticles Derived by Urea Condensation for Chemical Mechanical Polishing
4. Polishing mechanisms of various surfactants in chemical mechanical polishing relevant to cobalt interconnects
5. Research on weakly alkaline bulk slurries relevant to chemical mechanical polishing for cobalt interconnects
6. Exploiting interaction of fine and coarse features and attribute co-occurrence for person attribute recognition
7. LINC00958 promotes bladder cancer carcinogenesis by targeting miR-490-3p and AURKA
8. Potassium persulfate as an oxidizer in chemical mechanical polishing slurries relevant for copper interconnects with cobalt barrier layers
9. Extracting Discriminative Parts with Flexible Number from Low-Rank Features for Human Action Recognition
10. Corrosion Investigations of Ruthenium in Potassium Periodate Solutions Relevant for Chemical Mechanical Polishing
11. Augmenting bag-of-words: a robust contextual representation of spatiotemporal interest points for action recognition
12. Anisotropic clustering on surfaces for crack extraction
13. Extracting Refined Low-Rank Features of Robust PCA for Human Action Recognition
14. Tribocorrosion Study of Copper During Chemical Mechanical Polishing in Potassium Periodate-Based Slurry
15. Association between the cytotoxic T-lymphocyte antigen 4 +49A/G polymorphism and bladder cancer risk
16. Contact stress non-uniformity of wafer surface for multi-zone chemical mechanical polishing process
17. Effect of slurry injection position on material removal in chemical mechanical planarization
18. Solution of a sound field generated by the vibrating surface of a body moving at small Mach number
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