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Silicon photonic waveguide resonators, such as microring resonators, photonic crystal waveguide cavities, and Fabry–Perot resonators based on the distributed Bragg reflectors, are key device components for silicon-based photonic integrated circuits (Si-PIC). For the Si-PIC with high integration density, the device footprints of the conventional photonic waveguide resonators need to be more compact. Inverse design, which is operated by the design expectation and different from the conventional design methods, has been investigated for reducing the photonic device components nowadays. In this paper, we inversely designed the silicon photonic waveguide reflectors for two target wavelengths: one is 1310 nm and the other is 1550 nm. The silicon photonic waveguide reflectors have reflectance of 0.99993 and 0.9955 for the wavelength of 1310 nm and 1550 nm each with 5-μm-long reflectors. Also, we theoretically investigated Fabry–Perot resonators based on the inversely designed photonic waveguide reflectors. Qfactors of the Fabry–Perot resonators have been calculated to be 1.3 × 105for the wavelength of 1310 nm and 2583 for the wavelength of 1550 nm. We have expected that the inversely designed photonic waveguide reflectors and their applications for the Fabry–Perot resonators can be utilized for compact passive/active device components such as wavelength filters, modulators, and external cavity lasers.

Because a fusion edge plasma contains various atomic and molecular processes, along with various plasma–material interactions (PMIs) for post-mortem analyses, a linear plasma device can simulate divertor and scrape-off layer (SOL) plasmas with DC edge relevant parameters, although it cannot generate a high ion temperature and toroidicity with much less power density compared to toroidal devices. The Divertor Plasma Simulator-2 (DiPS-2), a linear device with an LaB6DC cathode, has been used for a few fusion-relevant physics experiments, including edge localized mode (ELM) simulation and edge transport of diffusion and convection. An ELM simulation has been performed by modulating the magnetic field relevant to the pressure modulation of a toroidal device, and the diffusion coefficients of free and bound presheaths have been measured in simulations of divertor or limiter transport. Moreover, the convection of the filament or the bubble expansion to the first wall has also been analyzed. In addition to various atomic and molecular processes in SOL and divertor plasmas, PMIs must be analyzed both on and beneath the surface of the plasma-facing components (PFCs) because of surface modification. Using DiPS-2 and other linear devices along with Korea Superconducting Tokamak Advanced Research (KSTAR), PMIs have been analyzed in terms of the following elements or processes: (1) boronizations, both for dust interactions with the surface chamber (DiSC) and KSTAR device, are analyzed; (2) carbon damage by the dense heat flux of DiPS-2 is experimentally investigated; (3) the density profile of the lithium injection gettering of hydrogen and its transport experiments (LIGHT-1) device is analytically calculated; (4) the effect of nitrogen on the relaxation of the heat flux to the divertor tile is experimentally analyzed; and (5) tungsten as the divertor tile material is analyzed via laser ELM simulations in terms of dust generation and surface modification.

Although the research on divertors and scrape-off layers (SOLs) has been not as focused on as the recent success of the Korean fusion program, a few linear plasma devices have been developed for simulating divertor and SOL plasmas: (1) diversified plasma simulator (DiPS), a versatile linear machine, has been developed for simulations of divertor and space plasmas with various electric probes, such as single, triple, and Mach Probes and gridded energy analyzer. DiPS consists of two major parts: a divertor plasma simulator with a LaB6DC plasma source and a space plasma simulator with a helicon RF plasma source, (2) divertor plasma simulator-1 (DiPS-1) is a part of DiPS with only a LaB6cathode, where a low-power laser-induced fluorescence (LIF) is added and more electric probe diagnostics are augmented; it is dedicated only for fusion edge and divertor plasmas, (3) Divertor Plasma Simulator-2 (DiPS-2) has been modified from the DiPS-1 by adding a magnetic nozzle with a limiter structure and by removing the helicon source and space chamber. DiPS-2 is a linear plasma device with a 4-inch LaB6cathode, the same as DiPS-1, and it is focused on the development of various diagnostics, such as those used for LIF and laser Thomson scattering (LTS) along with various electric probes, on the divertor and scrape-off plasmas and on the plasma-material interaction (PMI) research, such as that of tungsten and graphite as plasma-facing components (PFCs), (4) A Multi-Purpose Plasma (MP2) device is a renovation of the Hanbit mirror device [Kwon et al., Nucl. Fusion 43, 686 (2003)] with the installation of two plasma sources: LaB6(DC) and helicon (RF) plasma sources. A honeycomb-like large-area LaB6(HLA-LaB6) cathode has been developed for the divertor plasma simulation to improve the resistance against the thermal shock fragility for large (8-inch) and high density plasma generation, (5) DiPS-2 has been augmented by adding another cylindrical device, called the Dust interaction with Surfaces Chamber (DiSC) for the generation and diagnostics of dusts. This combined system (DiPS-2+DiSC) has added two more diagnostics: Laser Photo-Detachment (LPD) for dust density and laser Mie Scattering (LMS) for dust size. Moreover, dusts or negative ions have been analyzed by using electric probes and capacitive diagram gauges in Transport and Removal of Dusts (TReD) device.

Structural reflective colors based on Fabry–Perot (F–P) cavity resonances have attracted tremendous interest for diverse applications, such as color decoration and printing, display, and imaging devices. However, the asymmetric F–P cavity-based reflective colors proposed to date have low color purity and have difficulty to realize a desired vivid color because of a narrow absorption band characteristic in the visible light region. Here, a solution-processed, F–P ultra-broadband light absorber is newly proposed using a high lossy nanoporous material for vivid color generation. An asymmetric metal–insulator–metal structure consists of a high lossy nanoporous metallic film with coupled silver nanocrystals (Ag NCs) as the top layer. The absorbers not only increase the maximum absorption intensity up to ∼98% but also widen the bandwidth by 300 nm, resulting in high color purity in micrometer-scale pixels. Furthermore, the solution-based absorber shows potential to realize a high-resolution display pixel and anticounterfeiting devices having mechanical flexibility using the inkjet printing technology.

We developed a simple and systematic method to fabricate optically tunable and thermally and chemically stable Au–Ag nanocrystal-based plasmonic metamaterials. An Ag nanocrystal-based metamaterial with desirable optical properties was fabricated via nanoimprinting and ligand-exchange process. Its optical properties were controlled by selectively substituting Ag atoms with Au atoms through a spontaneous galvanic replacement reaction. The developed Au–Ag-based metamaterials provide excellent tunable plasmonic properties required for various applications in the visible and near-infrared regions by controlling the Au–Ag composition according to the conditions of the galvanic displacement. Furthermore, their thermal and chemical stabilities significantly improved because of the protective Au thin layer on the surface. Using this developed process, chemically and thermally stable and flexible plasmonic metamaterials were successfully fabricated on a flexible polyester terephthalate substrate.

The fabrication of an active-matrix liquid-crystal display by using printing processes offers the potential to reduce the number of photolithography steps and the manufacturing costs. In this study, we prepare the indium-zinc-oxide (IZO) thin-film transistors (TFTs) by using non-vacuum processes such as inkjet printing. The self-assembled monolayers of hexadecanethiol (HDT) on the surface of the oxide semiconductor prior to the inkjet printing of Ag were employed to modify the electric barrier between the IZO and the printed Ag. The field-effect mobility of the IZO TFTs with 0.5-mM HDT treatments and with the inkjet-printed Ag electrodes that were investigated by using their current-voltage characteristics was approximately 0.36 cm2/Vs.

Herein we describe a room-temperature, chemical process to transform silver nanocrystal solids, deposited from colloidal solutions, into highly conductive, corrosion-resistant, optical and electronic materials with nanometer-scale architectures. After assembling the nanocrystal solids, we treated them with a set of simple, compact, organic and inorganic reagents: ammonium thiocyanate, ammonium chloride, potassium hydrogen sulfide, and ethanedithiol. We find that each reagent induces unique changes in the structure and composition of the resulting solid, giving rise to films that vary from insulating to, in the case of thiocyanate, conducting with a remarkably low resistivity of 8.8 × 10–6Ω·cm, only 6 times that of bulk silver. We show that thiocyanate mediates the spontaneous sintering of nanocrystals into structures with a roughness of less than 1/10th of the wavelength of visible light. We demonstrate that these solution-processed, low-resistivity, optically smooth films can be patterned, using imprint lithography, into conductive electrodes and plasmonic mesostructures with programmable resonances. We observe that thiocyanate-treated solids exhibit significantly retarded atmospheric corrosion, a feature that dramatically increases the feasibility of employing silver for electrical and plasmonic applications.

We demonstrate thermally switchable VO2metamaterials fabricated using solution-processable colloidal nanocrystals (NCs). Vanadium oxide (VOx) NCs are synthesized through a nonhydrolytic reaction and deposited from stable colloidal dispersions to form NC thin films. Rapid thermal annealing transforms the VOxNC thin films into monoclinic, nanocrystalline VO2thin films that show a sharp, reversible metal–insulator phase transition. Introduction of precise concentrations of tungsten dopings into the colloidal VOxNCs enables the still sharp phase transition of the VO2thin films to be tuned to lower temperatures as the doping level increases. We fabricate “smart”, differentially doped, multilayered VO2films to program the phase and therefore the metal–insulator behavior of constituent vertically structured layers with temperature. With increasing temperature, we tailored the optical response of multilayered films in the near-IR and IR regions from that of a strong light absorber, in a metal–insulator structure, to that of a Drude-like reflector, characteristic of a pure metallic structure. We demonstrate that nanocrystal-based nanoimprinting can be employed to pattern multilayered subwavelength nanostructures, such as three-dimensional VO2nanopillar arrays, that exhibit plasmonic dipolar responses tunable with a temperature change.

We investigate the effects of stoichiometric imbalance on the electronic properties of lead chalcogenide nanocrystal films by introducing excess lead (Pb) or selenium (Se) through thermal evaporation. Hall-effect and capacitance–voltage measurements show that the carrier type, concentration, and Fermi level in nanocrystal solids may be precisely controlled through their stoichiometry. By manipulating only the stoichiometry of the nanocrystal solids, we engineer the characteristics of electronic and optoelectronic devices. Lead chalcogenide nanocrystal field-effect transistors (FETs) are fabricated at room temperature to form ambipolar, unipolar n-type, and unipolar p-type semiconducting channels as-prepared and with excess Pb and Se, respectively. Introducing excess Pb forms nanocrystal FETs with electron mobilities of 10 cm2/(V s), which is an order of magnitude higher than previously reported in lead chalcogenide nanocrystal devices. Adding excess Se to semiconductor nanocrystal solids in PbSe Schottky solar cells enhances the power conversion efficiency.

We have demonstrated amplification of luminescence in upconversion nanophosphors (UCNPs) of hexagonal phase NaYF4(β-NaYF4) doped with the lanthanide dopants Yb3+, Er3+or Yb3+, Tm3+by close proximity to metal nanoparticles (NPs). We present a configuration in which close-packed monolayers of UCNPs are separated from a dense multilayer of metal NPs (Au or Ag) by a nanometer-scale oxide grown by atomic layer deposition. Luminescence enhancements were found to be dependent on the thickness of the oxide spacer layer and the type of metal NP with enhancements of up to 5.2-fold proximal to Au NPs and of up to 45-fold proximal to Ag NPs. Concomitant shortening of the UCNP luminescence decay time and rise time is indicative of the enhancement of the UCNP luminescence induced by resonant plasmonic coupling and nonresonant near-field enhancement from the metal NP layer, respectively.

In current pharmaceutical research and development, not many robust design (RD) and tolerance design (TD) approaches have been applied, although many researchers and practitioners have realised the importance of process design concepts. Pharmaceutical characteristics often involve different types of destructive measurements, such as hardness, friability, and disintegration in drug development and manufacturing processes. The primary objective of this paper is to develop an integrated robust-tolerance design methodology for handling destructive quality characteristics on pharmaceutical study. A statistical TD optimisation method, which incorporates consumer and producer risk, is proposed that uses a surrogate variable that is strongly correlated with the destructive quality characteristic. Finally, a pharmaceutical case study is performed for verification purposes. In the case study, a comparison between two RD optimisation models (i.e., dual-response and mean squares error models) is also conducted.

The multilevel switching characteristics of stacked phase change materials with the structures of Ge2Sb2Te5, AgInSbTe/Ge2Sb2Te5, and GeTe/Ge2Sb2Te5were investigated at the nano scale using nanoimprint lithography and conductive atomic force microscopy. Stacked phase change materials devices consisting of nano pillars 200 nm in diameter were fabricated using nanoimprint lithography, and their electrical characteristics were evaluated using conductive atomic force microscopy, with a pulse generator and a voltage source. The stacked GeTe/Ge2Sb2Te5phase change materials exhibited three levels of resistance with a difference of 2 orders in magnitude between them, while the single-layer and stacked phase change materials with similar electrical resistances, such as Ge2Sb2Te5/AgInSbTe exhibited only bi level switching characteristics.

In this study, nanopillar-shaped phase-change memory devices of various sizes were simply fabricated by nanosphere lithography, and their electrical characteristics were evaluated by conductive atomic force microscopy (AFM). As nanosphere materials, 180-nm diameter polystyrene balls were used for a size-controllable mask, silica balls with a diameter of 200 nm for a high etching-resistance mask, and sub-50 nm Ag nanoparticles were used for sub-50-nm-scale fabrication. Using the polystyrene balls, silica balls, and Ag nanoparticles, nanopillar-shaped phase-change memory devices with various diameters, heights as large as 1 μm, and sizes as small as less than 50 nm were successfully fabricated. The electrical properties of the nanopillar-shaped Ge2Sb2Te5devices were evaluated by conductive AFM with an electrical measurement system.

Abstract: As narrow as 50 nm metal nanowire array patterns were successfully fabricated by nanoimprint lithography (NIL) using thermally curable monomer based resin. Compared to conventional hot embossing lithography, which has used thermoplastic polymers such as PMMA as an imprint resin and thus process temperature and pressure are over 180°C and 50 bar, respectively, thermally curable monomer based resin enabled imprint process at relatively lower temperature (120°C) and pressure (20 bar). Due to the highly fluidic nature of monomer based liquid phase resin, residual layer was not observed after imprinting. Imprinted resist pattern was then treated with oxygen plasma for 5 seconds and 5 nm of Ti layer and 15 nm of Au layer was deposited by e-beam evaporation. The imprinted resist pattern was lifted-off by dipping into an organic solvent, such as acetone. As the result, as narrow as 50 nm Au nanowire array pattern with area of 30 mm × 40 mm was fabricated on a Si substrate. 30 mm × 40 mm of nanowire pattern area was not limited by nanoimprint process, but the laser interference lithography process, which was used to fabricated the master template for imprinting.

Sub-micron sized, conical shaped moth-eye structure was transferred to thermoplastic polymer film, such as polyvinyl chloride (PVC) using hot embossing process. Since master template was made of polycarbonate, embossing temperature and pressure were carefully maintained to 100°C and 10 atm. Conical shaped moth-eye pattern was reversed to tapered hole pattern on PVC film. Hot embossed PVC film was then used as transparent template for subsequent UV nanoimprint process, in order to form the conical shaped sub-micron moth-eye structure on glass substrate. After thin layer of Si oxide and monolayer of self-assembled, silane based molecules was coated on hot embossed PVC film. UV nanoimprint process was done on the glass substrate using hot embossed PVC film. As a result, the transmittance of glass substrate was increased from 91 to 94% for single side patterned and 96% for both side patterned glass substrate for the spectral range of 350 to 800 nm.Sub-micron sized, conical shaped moth-eye structure was transferred to thermoplastic polymer film, such as polyvinyl chloride (PVC) using hot embossing process. Since master template was made of polycarbonate, embossing temperature and pressure were carefully maintained to 100°C and 10 atm. Conical shaped moth-eye pattern was reversed to tapered hole pattern on PVC film. Hot embossed PVC film was then used as transparent template for subsequent UV nanoimprint process, in order to form the conical shaped sub-micron moth-eye structure on glass substrate. After thin layer of Si oxide and monolayer of self-assembled, silane based molecules was coated on hot embossed PVC film. UV nanoimprint process was done on the glass substrate using hot embossed PVC film. As a result, the transmittance of glass substrate was increased from 91 to 94% for single side patterned and 96% for both side patterned glass substrate for the spectral range of 350 to 800 nm.

When the nature of measuring a performance variable is destructive or expensive to inspect, a surrogate variable which is strongly correlated with the performance variable can be used. Most of the models of screening procedures reported in the literature assume that rejected items are scrapped, and that performance and surrogate variables follow a bivariate normal distribution. In many industrial settings, however, the rejected items are often reprocessed or recycled for cost reduction and/or environmental protection purposes. In this situation, conventional models of screening procedures become ineffective. In this paper, we propose new economic screening procedures with dichotomous performance variable T and continuous surrogate variable X in situations where the rejected items are reprocessed. Two models – normal and logistic models – are developed. Profit models are constructed which include four price/cost components: selling price, cost from an accepted non-conforming item, and reprocessing and inspection costs. Methods of finding the optimal screening procedures are presented and numerical examples are given.

Artificial polycarbonate moth eye structured plate was used to emboss the moth eye nano-pattern into PVC films. Embossing was done at 100°C to prevent any damage on polycarbonate template. With embossing of moth eye nano-patterns, transmittance of PVC film was increased up to 6% over 400nm to 800nm wavelength region. This embossed PVC film was then used as an imprint template after depositing thin layer of SiO2 and self-assembled monolayer. Consequently, polymer based moth eye nano-patterns were formed on glass template after UV imprinting and its transmittance was increased from 90% to 92%.

Self-Assembled Monolayer (SAM) is a single layer of ordered molecules absorbed on a surface by chemical bonding between the molecular head group and the surface. The surface properties can be controlled by the terminal functional group of the SAM layer. In order to utilize SAM layers for device applications, SAM layer needs to be patterned as a sub-micron size. Patterning of SAM layer in sub-micron size has been done by various techniques including direct-writing by dip-pen nano lithography, selective etching with UV photons, and selective deposition of SAM layer by &-contact printing. In this study, silane based SAM layer was patterned to the sub-micron size using zero residual Nano imprint Lithography, which is regarded as next generation lithography technique due to its simplicity, high throughput and high resolution pattern transferring capability. Using zero-residual layer imprinting, 300nm~2um sized SAM patterns can successfully fabricated. In order to check the surface property of patterned SAM layer, a solution containing nano Ag particles was spin-coated on the SAM patterned substrate and nano Ag particles were selectively deposited on the substrate.

Embossing lithography is one of the most promising technologies for mass production of nano-scale structures. To advance the industrialization of embossing lithography, fabrication of low cost, high mechanical strength embossing template is essential. Electroformed Ni template can be used as an embossing template if its poor anti-adhesive property is fixed by proper releasing layer treatment, especially, when it is used with sticky thermoset polymer. In this experiment, quartz master template with 200nm to 2um sized surface protrusions was fabricated and used to emboss the PMMA coated Si wafer. Then the embossed PMMA layer was coated with metal seed layer (Ni) and electroplating of Ni was followed to fabricate Ni template. To apply anti-stiction SAM layer, SiO2 and Si layer was coated on Ni template. With proper anti-stiction treatment of Ni template, sub-micron patterns were successfully transferred to sticky thermoset polymers such as epoxy resin using Ni template without any degradation of anti-adhesive property.

Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.

A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.

In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as 100nm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85ºC and 5atm.

Embossing or imprint lithography is the key-technology for the mass production of nanosized structures with low cost. Currently Si or quartz template which is produced by e-beam or DUV lithography and reactive ion etching, is used. However they are very expensive and easily damaged due to their brittleness. On the other hand, Ni template has high mechanical durability and can be fabricated with low cost by electroplating. However, one of the key obstacles of Ni template is poor antistiction property, when it is used with sticky thermoset polymer. Due to its poor antistiction property, detachment of Ni template from epoxy substrate is one of the key obstacles. In this experiment, quartz template with 150nm to 1μm sized surface protrusion was fabricated and used to emboss the PMMA coated Si wafer. Then the imprinted PMMA layer was coated with metal seed layer and electroplating of Ni was followed to fabricate Ni template with 150nm to 1μm sized patterns. In order to form antistiction layer on Ni template, SAM antistiction layer was formed on SiO2 coated Ni template. As a result, nano patterns could be successfully transferred to sticky thermoset polymer using Ni template without any degradation of antistiction property.

Embossing or imprint lithography is the key-technology for the mass production of nanosized structures with low cost. Currently Si or quartz template which is produced by e-beam or DUV lithography and reactive ion etching, is used. However they are very expensive and easily damaged due to their brittleness. On the other hand, Ni template has high mechanical durability and can be fabricated with low cost by electroplating. However, one of the key obstacles of Ni template is poor antistiction property, when it is used with sticky thermoset polymer. Due to its poor antistiction property, detachment of Ni template from epoxy substrate is one of the key obstacles. In this experiment, quartz template with 150nm to 1μm sized surface protrusion was fabricated and used to emboss the PMMA coated Si wafer. Then the imprinted PMMA layer was coated with metal seed layer and electroplating of Ni was followed to fabricate Ni template with 150nm to 1μm sized patterns. In order to form antistiction layer on Ni template, SAM antistiction layer was formed on SiO2 coated Ni template. As a result, nano patterns could be successfully transferred to sticky thermoset polymer using Ni template without any degradation of antistiction property.

The fabrication of nano-structured materials using nanoimprint lithography has become more prevalent in recent years, due to its cost effectiveness and readiness. However, One of the biggest drawback of this technique is the fabrication of the imprinting stamp, which is expensive and difficult to fabricate. This paper describes a method of replication original Si or quartz made imprinting template into a polymer stamp which has many advantages, such as the simplicity and low cost of the fabrication process and the flexibility of the resulting stamp. Using the hot embossing method, PVC based imprint stamp with sub 100nm patterns can be fabricated. Due to its high UV transmittance, reasonable mechanical hardness and low surface energy, PVC based nanosized template can be used as a stamp for UV-NIL and sub 100nm patterns were successfully transferred by the UV-NIL process with PVC based imprint stamp.

UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.

We present a new vertex selection scheme for polygon-based contour coders. When contour coding is used for image coding applications, it is argued that partitioning a contour into partial segments and then approximating these segments with a variable accuracy is required to efficiently handle their relative significance. Accordingly, a decision rule for the allowable maximum distortion (dmax)is derived based on interregion contrasts, and an adaptive vertex selection method is proposed based on the derived rule. Experimental results are presented to show the superiority of the proposed method over conventional methods. © 2004 Society of Photo-Optical Instrumentation Engineers.

In this paper we consider the problem of determining the optimum target value of the quality characteristic of interest and the screening limits for a correlated variable under single and two-stage screenings. In single-stage screening, inspection is performed directly on the quality characteristic of interest or on a variable that is correlated with the characteristic. In two-stage screening, the correlated variable is inspected first to decide if an item should be accepted, rejected, or whether additional observations should be taken. If additional observations are required, the quality characteristic is then directly observed in order to classify the undecided items. Models are constructed that involve selling and discounted prices as well as production, inspection, and penalty costs for both single and two-stage screenings. Methods for finding the optimum process mean and the screening limits are presented when the quality characteristic and the correlated variable are assumed to be jointly normally distributed. A numerical example is presented.

Reconfigurable light absorbers have attracted much attention by providing additional optical responses and expanding the number of degrees of freedom in security applications. Fabry–Pèrot absorbers based on phase change materials with tunable properties can be implemented over large scales without the need for additional steps such as lithography, while exhibiting reconfigurable optical responses. However, a fundamental limitation of widely used phase change materials such as vanadium dioxide and germanium–antimony–tellurium-based chalcogenide glasses is that they have only two distinct phases; therefore, only two different states of optical properties are available. Here, we experimentally demonstrate active multilevel absorbers that are tuned by controlling the external temperature. This is produced by creating large-scale lithography-free multilayer structures with both undoped and tungsten-doped solution-processed monoclinic-phase vanadium dioxide thin films. The doping of vanadium dioxide with tungsten allows for the modulation of the phase-transition temperature, which results in an extra degree of freedom and therefore an additional step for the tunable properties. The proposed multilevel absorber is designed and characterized both numerically and experimentally. Such large-scale multilevel tunable absorbers realized with nanoparticle-based solution fabrication techniques are expected to open the way for advanced thermo-optical cryptographic devices based on tunable reflective coloration and near-infrared absorption.

This paper investigates the effect of measurement errors on the optimum process mean for a filling process. In this filling process, containers are filled with an expensive ingredient and containers weighing above a specified limit are sold in a regular market for a fixed price, while the underfilled containers are reprocessed at a cost. It is assumed that the quantity of the ingredients in the container and the observed weight of the container are normally distributed. A profit model is constructed which involves the selling price, the cost of the ingredients, the reprocessing cost, and the cost of accepting an underfilled container. Methods for finding the optimum process mean and cutoff value of the observed weight are presented, and a numerical example is given.

For situations where there are several markets with different profit/cost structures, economic screening procedures with dichotomous performance variable T and continuous screening variable X are proposed for determining the market to ship the products to. Logistic and normal models are considered. It is assumed that P[T = 1|X = x] is given by a logistic function in the logistic model and X given T is normally distributed in the normal model. Profit models are constructed which involve three profit/cost components: profit from a conforming item, cost from an accepted nonconforming item, and screening inspection cost. Methods of finding the optimal screening procedures are presented and a numerical example is given.

Various colors are implemented in solar cells without optical losses using light diffractions via grating structure. By utilizing the property of diffraction angle variations depending on the diffraction order, wavelength, grating period, and incident angle, many vivid colors are realized at different observation angles. Well-defined grating structures with periods of 770 nm and 1400 nm are uniformly fabricated on Cu(In,Ga)Se2thin-film solar cells by a nanotransfer lithography using ZnO nanoparticles. Color-to-angle sensitivity, color brightness, and diffraction efficiency depend on the grating period and incident angle. A wide range of colors, mainly resulting from the 1st-order diffraction are observed in the range of observation angles within 20°. The solar cell performances hardly degrade due to the negligible optical transmission loss in the nanograting structure. The grating applied solar cells show additional advantages: short-circuit current gains in oblique incident light and a self-cleaning effect due to the enhanced hydrophobicity. Through this study, the photovoltaic modules are expected to not only remain as electricity generators, but also become aesthetic structures that can provide aesthetic pleasure to people.

A new narrowband interference suppression scheme based on time-frequency localised subspace tracking is presented. The received nonstationary signal is time-frequency-localised to extract stationary signal segments, on which reduced-order subspace tracking is applied to achieve interference suppression. Simulation reveals that this new scheme performs as well as the subspace decomposition scheme with a dramatically reduced computational complexity.

In this study, we prepared the separators of supercapacitors on cellulous films and papers by using an inkjet printing technology. Several different ink materials such as carbon nanotubes and metal oxides were introduced and the influence of the base materials used as separator was also investigated. The interface topologies and electric properties of the so formed supercapacitors were investigated by a scanning electron microscope and the measuring system of charge-discharge cycles, respectively.

We demonstrate a simple direct nanoimprint lithography method of fabricating a copper oxide memory device for soft nanoelectronics. The process was done at room temperature with low pressure, so that a Cu2O resistive nanoarray could be fabricated not only on the Si substrate but also on the flexible polyimide substrate. The resistive switching of the fabricated 200 nm Cu2O nanopillar was observed at 2 V with a low current compliance of 5 µA from a high-resistance state to a low-resistance state, and the reversible switching was done with a fast switching time of 10 ns and high endurance.

Oral mucositis is a common toxicity associated with cancer therapies and increases risk for infection, mortality, and extended hospital stay. Prophylactic use of a supersaturated calcium phosphate mouth rinse (SSCPR, Caphosol®) was found in a phase III study to reduce the frequency, intensity, and duration of oral mucositis in patients (pts) undergoing allogeneic or autologous hematopoietic stem cell transplantation (Papas, et al. Bone Marrow Transpl 2003;31:705). That study also found a faster time to recovery of an absolute neutrophil count (ANC) ≥0.2×109/l, but not for other engraftment endpoints, likely a result of the mixed pt population studied.A single-center retrospective review of two uniform populations undergoing autologous peripheral blood stem cell transplantation (PBSCT) to determine if an effective regimen of mucositis prophylaxis results in faster engraftment and shorter hospital stays.Two different uniform population of pts ≤70 years of age with Hodgkin or non-Hodgkin lymphoma (HL/NHL) and multiple myeloma (MM) undergoing PBSCT between 1/1/07 and 12/31/09 (Table 1). MM pts were conditioned with single dose melphalan (N= 16 with 140 mg/m2; N= 203 with 200 mg/m2). HL/NHL pts were conditioned with BEAM. Oral ice chips were given during the melphalan infusion for all pts. Filgrastim, 5 ug/kg, was given on days +3, +5, +7, +9 and then daily until granulocyte engraftment. A regimen of oral hygiene using sodium bicarbonate (NaHCO3) tooth cleaning after each meal with as needed rinsing was encouraged. SSCPR was added to this regimen in May 2008 with pts instructed to rinse 4-times daily after teeth cleaning and as needed. Granulocyte engraftment was defined as the first day with a rising ANC ≥0.5×109/l, and platelet engraftment was defined as the first day of a rising platelet count ≥20×109/l. Prospective scoring of mucositis was not performed and the use of intravenous fluconazole, ciprofloxacin, and/or acyclovir prophylaxis was recorded as a surrogate indicator of severe mucositis. Engraftment times and time to hospital discharge were estimated using the method of Kaplan and Meier, and the groups were compared using the log-rank test. The Mann-Whitney U test was used to assess differences in median values of age and CD34 cells infused, and Fisher's Exact test was used to assess the significance of differences categorical parameters. Results: No differences were found between the control and study populations for age, gender, diagnosis, or CD34+ cell content of the graft (Table 1). For the HL/NHL control group one pt failed to engraft and was censored at the time of infusion of backup PBSC. In the MM groups no pts failed to engraft. No pts for either diagnosis were censored for death or relapse before hospital discharge. For both populations, pts using SSCPR achieved the primary endpoints of engraftment and were discharged home a median of 1 day faster than the respective control group pts (Table 2). 18 pts in the HL/NHL control group and 20 pts in the SSCPR group experienced febrile neutropenia (p=1.0) and 4 pts in each group were given intravenous medications (p=1.0). 73 pts in the MM control group and 53 pts in the SSCPR group experienced febrile neutropenia (p=0.22). 11 pts in the control group and 10 pts in the SSCPR group were given intravenous medications (p=1.0). These retrospective data of sequentially treated cohorts suggest that an effective regimen of mucositis prophylaxis may result in faster engraftment and shorter hospital stays with fewer days of antibiotics and cytokines. This retrospective study lacks detail regarding the incidence of mild/moderate mucositis and a mechanism of this action cannot be discerned from these data.Rowley: EUSA Pharmaceautical: Speakers Bureau.

Abstract 4569