1. The sub-micron semiconductor challenge.
- Author
-
Hurst, Aaron
- Subjects
SEMICONDUCTORS ,NEAR-field microscopy ,OPTICAL materials ,LASER pumping ,QUANTUM dots ,FEMTOSECOND lasers - Abstract
This article explores the challenges faced in inspecting and measuring semiconductors at sub-micron and nanoscale levels. Traditional methods are proving inadequate, leading to the adoption of photonics-based solutions such as photonic microscopy, ellipsometry, interferometry, scatterometry, and spectroscopy. Pulsed lasers and femtosecond lasers are also being used for material characterization and quality control. The article emphasizes the significance of alignment in wafer measurement and the need for alternative technologies to enhance inspection and defect characterization. It also discusses the impact of defects on semiconductor device performance and functionality, highlighting the importance of understanding and mitigating these issues for improved reliability and efficiency. The article is a valuable resource for library patrons researching semiconductors and their applications. [Extracted from the article]
- Published
- 2024