13 results on '"Amblard, Gilles R."'
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2. Development and characterization of 193-nm ultra-thin resist process
3. 193-nm photoresists at 130-nm node: which lithographic performances for which chemical platform?
4. 0.18-μm technology at contact level: deep-UV process development by tuning NA/o and using a bottom antireflective coating
5. Optical extension at the 193-nm wavelength
6. 193-nm single-layer process for 150-nm technology generation and below
7. Lithographic evaluation of deep-UV photoresists for 0.25- and 0.18-μm technology design rules
8. Application of plasma-polymerized methylsilane for 0.18-μm photolithography
9. Advanced i-line lithography: evaluation of a new chemical amplification negative resist
10. Role of surface tension in silylation processes
11. Wet-developed, high-aspect-ratio resist patterns by 20-keV e-beam lithography
12. Bilevel System HPR/PMMA
13. Characterization of commercial dyes for PMMA bilayer systems
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