79 results on '"Blanquet, E."'
Search Results
2. Coupling powder bed additive manufacturing and vapor phase deposition methods for elaboration of coated 3D Ti-6Al-4V architectures with enhanced surface properties
3. International collaborative follow-up investigation of graduating high school students’ understandings of the nature of scientific inquiry: is progress Being made?
4. In situ x-ray studies of the incipient ZnO atomic layer deposition on In0.53Ga0.47As
5. Prediction of dislocation density in AlN or GaN films deposited on (0001) sapphire
6. Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
7. Superconducting properties of NbTiN thin films deposited by high-temperature chemical vapor deposition
8. Reactive chemical vapor deposition of heteroepitaxial Ti1−xAlxN films
9. SiGe oxidation kinetics and oxide density measured by resonant soft X-ray reflectivity
10. HVPE of aluminum nitride, film evaluation and multiscale modeling of the growth process
11. Superconducting properties of very high quality NbN thin films grown by high temperature chemical vapor deposition
12. Evolution of Crystal Structure During the Initial Stages of ZnO Atomic Layer Deposition
13. Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy
14. Study of Ti-Rich and Al-Rich Contact Metallization for AlGaN/GaN HEMT Power Devices
15. Epitaxial growth of AlN on c-plane sapphire by High Temperature Hydride Vapor Phase Epitaxy: Influence of the gas phase N/Al ratio and low temperature protective layer
16. CFD modeling of the high-temperature HVPE growth of aluminum nitride layers on c-plane sapphire: from theoretical chemistry to process evaluation
17. Analysis of the iodine gas phase produced by interaction of CsI and MoO3 vapours in flowing steam
18. High temperature chemical vapor deposition of aluminum nitride, growth and evaluation
19. New method to evaluate materials outgassing used in MEMS thin film packaging technology
20. Characterization of nitrogen-doped TiO2 thin films for photovoltaic applications
21. Outgassing characterization of MEMS thin film packaging materials
22. Effects of the V/III ratio on the quality of aluminum nitride grown on (0001) sapphire by high temperature hydride vapor phase epitaxy
23. Preferential orientation of fluorine-doped SnO2 thin films: The effects of growth temperature
24. Experimental kinetic study of oxidation of uranium monocarbide powders under controlled oxygen partial pressures below 230°C
25. Effects of AlN nucleation layers on the growth of AlN films using high temperature hydride vapor phase epitaxy
26. Investigation on AlN epitaxial growth and related etching phenomenon at high temperature using high temperature chemical vapor deposition process
27. Conformal Atomic Layer Deposition of TA-Based Diffusion Barrier Film Using a Novel Mono-Guanidinate Precursor
28. Experimental study of uranium carbide pyrophoricity
29. Growth and Characterization of Thick Polycrystalline AlN Layers by HTCVD
30. High temperature chemical vapor deposition of AlN/W1−xRex coatings on bulk SiC
31. Epitaxial and polycrystalline growth of AlN by high temperature CVD: Experimental results and simulation
32. Atomic layer deposition of tantalum oxide thin films for their use as diffusion barriers in microelectronic devices
33. Experimental thermodynamics for the evaluation of ALD growth processes
34. Thermodynamic and experimental study of UC powders ignition
35. Thermodynamic and experimental investigations on the growth of thick aluminum nitride layers by high temperature CVD
36. Gaseous Phase Study of the Zr-Organometallic ALD Precursor TEMAZ by Mass Spectrometry
37. ESD and ALD Depositions of Ta[sub 2]O[sub 5] Thin Films Investigated as Barriers to Copper Diffusion for Advanced Metallization
38. XPS studies of the ALD-growth of TaN diffusion barriers: Impact of the dielectric surface chemistry on the growth mechanism
39. Chemical vapor deposition of thin films and coatings: Evaluation and process modeling
40. Chlorinated silicon carbide CVD revisited for polycrystalline bulk growth
41. Silicon nanostructures for DNA biochip applications
42. DNA microarrays on silicon nanostructures: Optimization of the multilayer stack for fluorescence detection
43. Elaboration of Ta2O5 Thin Films Using Electrostatic Spray Deposition for Microelectronic Applications
44. High temperature processing of poly-SiC substrates from the vapor phase for wafer-bonding
45. Density functional study of the stability and electronic properties of TaxNy compounds used as copper diffusion barriers
46. Thermodynamic Aspects of the Growth of SiC Single Crystals using the CF‐PVT Process
47. Plasma etching of HfO2 at elevated temperatures in chlorine-based chemistry
48. Detection of subnanometric layer at the Si∕SiO2 interface and related strain measurements
49. Modeling and simulation of SiC CVD in the horizontal hot-wall reactor concept
50. Vapor phase techniques for the fabrication of homoepitaxial layers of silicon carbide: process modeling and characterization
Catalog
Books, media, physical & digital resources
Discovery Service for Jio Institute Digital Library
For full access to our library's resources, please sign in.