57 results on '"Hubička, Z."'
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2. CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering
3. WO3 and WO3-x thin films prepared by DC hollow cathode discharge
4. Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture
5. High rate deposition of photoactive TiO2 films by hot hollow cathode
6. The comparative study of electrical, optical and catalytic properties of Co3O4 thin nanocrystalline films prepared by reactive high-power impulse and radio frequency magnetron sputtering
7. In-situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition
8. Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
9. Floating harmonic probe for diagnostic of pulsed discharges
10. α-Fe2O3/TiO2 stratified photoanodes
11. Fe-Ti alloy layer plasma deposition – Monitoring of plasma parameters and properties of deposited alloys, anodization and photoelectrochemical characterization
12. Floating harmonic probe measurements in the low-temperature plasma jet deposition system
13. Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O2 mixtures
14. Cathode voltage and discharge current oscillations in HiPIMS
15. System for time-resolved laser absorption spectroscopy and its application to high-power impulse magnetron sputtering
16. A modified Katsumata probe—Ion sensitive probe for measurement in non-magnetized plasmas
17. Semiconducting WO3 thin films prepared by pulsed reactive magnetron sputtering
18. ZnO thin films prepared by surfatron produced discharge
19. Time-resolved tuned diode laser absorption spectroscopy of pulsed plasma
20. Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system
21. Investigation of reactive HiPIMS+MF sputtering of TiO2 crystalline thin films
22. Time-resolved tunable diode laser absorption spectroscopy of pulsed plasma
23. Experimental Study of the Discharge in the Low Pressure Plasma Jet Sputtering System
24. Raman spectroscopy of dip-coated and spin-coated sol–gel TiO2 thin films on different types of glass substrate
25. Imprint Behavior of Piezoelectric PZT Thin Films Deposited onto Cu-Coated Polymer Substrates
26. Spatial Distribution of Plasma Parameters in DC‐Energized Hollow Cathode Plasma Jet
27. A Study of Plasma Parameters in Hollow Cathode Plasma Jet in Pulse Regime
28. Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system
29. Atmospheric Barrier–Torch Discharge Deposited ZnO Films: Optical Properties, Doping and Grain Size Effects
30. Langmuir probe diagnostics of a plasma jet system
31. Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system
32. Electrical Probe Diagnostics of the Hollow Cathode Plasma Jet System for Deposition of TiOxThin Films
33. Deposition of BaxSr1-xTiO3thin Films by Double RF Hollow Cathode Plasma Jet System
34. Study of Electronegative Ar/O2Discharge by Means of Langmuir Probe
35. Measuring the Ion Flux to the Deposition Substrate in the Hollow Cathode Plasma Jet
36. Time-resolved probe diagnostics of pulsed DC magnetron discharge during deposition of TiO layers
37. Investigation of the time evolution of plasma parameters in a pulsed magnetron discharge
38. Measurements of plasma parameters during BaxSr1−x TiO3 thin films deposition by double hollow cathode plasma jet system
39. A study of barrier-torch plasma jet system at atmospheric pressure
40. Luminescence Properties of BaxSr1 −xTiO3Thin Films Deposited by RF Hollow Cathode Plasma Jet System
41. Measurement of Plasma Parameters in Low Temperature High Density Hollow Cathode Plasma Jet Working in Magnetic Field
42. Plasma diagnostics in the pulse magnetron sputtering system used for deposition Ti-C:H thin films
43. Investigation of the RF pulse modulated plasma jet system during the deposition of Pb(ZrxTi1−x)O3 thin films on polymer substrates
44. Composition of Ti-C:H films obtained by pulsed and continuous magnetron sputtering
45. BaxSr1 − xTiO3Thin Films Deposited by RF Hollow Cathode Plasma Jet Technique
46. Rf Hollow Cathode Plasma Jet Depopsition of BaxSR1-XTI03 Films
47. Investigation of the RF plasma jet system for deposition of LiCoOx thin films
48. Probe diagnostics of the RF barrier-torch discharge at atmospheric pressure
49. Investigation of the atmospheric RF torch-barrier plasma jet for deposition of CeOx thin films
50. Investigation of the rf and dc hollow cathode plasma-jet sputtering systems for the deposition of silicon thin films
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