12 results on '"Ruhm, Matthias"'
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2. Excursion prevention by edge placement error reduction using photomask tuning
3. Measuring inter-layer edge placement error with SEM contours
4. Matching between simulations and measurements as a key driver for reliable overlay target design
5. Combined process window monitoring for critical features
6. Influence of the process-induced asymmetry on the accuracy of overlay measurements
7. Overlay leaves litho: impact of non-litho processes on overlay and compensation
8. Scanner grid recipe creation improvement for tighter overlay specifications
9. Effects of focus difference of nested and isolated features for scanner proximity matching
10. Simulation-based scanner tuning using FlexRay capability and scatterometry
11. Use of scatterometry for scanner matching
12. Improving lithographic performance for 32 nm
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