4 results on '"Seiichi Watanabe"'
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2. Plasma Cleaning and Etching Using Quartz Bell Jar with SnO2 Transparent Thin-Film Heater in CHF3–SiO2 Mocrowave Etching System
3. Plasma Cleaning by Use of Hollow-Cathode Discharge in a CHF3-SiO2 Dry-Etching System
4. Measurement of a Three-Dimensional Distribution of Microwave Electric Field in Electron Cyclotron Resonance Plasmas
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