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Low-temperature luminescence spectra reveal the presence of two independant populations of GaN excitons within a $\mathrm{GaN/AlGaN/GaN/Al_2O_3}$ heterostructure in which a thick (1.5 $\mathrm{\mu m}$) AlGaN layer separates a thin (150 nm) top GaN layer and a thick (3.5 $\mathrm{\mu m}$) bottom GaN layer grown on sapphire. The presence of these two spectrally-distinct families of excitons in each GaN layer of the heterostructure is demonstrated using three different experimental methods: (i) low-power $\mathrm{\mu}$-photoluminescence ($\mathrm{\mu PL}$) using laser excitation sources with wavelengths above and below the AlGaN bandgap, (ii) $\mathrm{\mu PL}$ as a function of optically injected free carrier density, and (iii) quantitative numerical simulation of the $\mathrm{\mu}$-Reflectivity ($\mathrm{\mu R}$). One major impact of the built-in electric field is the reduction of the excitonic lifetime in the GaN surface layer, which transitions from less than 10 ps in the presence of the built-in electric field to the bulk lifetime (90 ps) when the field is screened. This increase in the excitonic lifetime is related to the modification of the band structure in the presence of optically injected free carriers. The effect of these lifetime variations on the luminescence spectra is analyzed. Lastly, we provide an estimate of the Mott density in GaN as $n_{\mathrm{Mott}} = 4\times 10^{17}\, \mathrm{cm^{-3}}$ at 130 K, consistent with values reported in the literature and accounting for the free carrier density required to screen the electric field.

The polarization discontinuity across interfaces in polar nitride-based heterostructures can lead to the formation of two-dimensional electron and hole gases. In the past, the observation of these electron and hole gases has been achieved through various experimental techniques, most often by electronic measurements but occasionally by optical means. However, the occurrence of a two-dimensional hole gas has never been demonstrated optically. The objective of this article is to demonstrate, thanks to the combination of various optical spectroscopy techniques coupled to numerical simulations, the presence of a two-dimensional hole gas in a GaN/AlGaN/GaN heterostructure. This is made possible thanks to a GaN/AlGaN/GaN heterostructure displaying a micrometer-thick AlGaN layer and a GaN cap thicker than in conventional GaN-based HEMTs structures. The band structure across the whole heterostructure was established by solving self-consistently the Schr\"odinger and Poisson equations and by taking into account the experimentally determined strain state of each layer. Continuous and quasi-continuos photoluminescence reveal the presence of a broad emission band at an energy around 50 meV below the exciton emission and whose energy blueshifts with increasing excitation power density, until it is completely quenched due to the complete screening of the internal electric field. Time-resolved measurements show that the emission arising from the two-dimensional hole gas can be assigned to the recombination of holes in the potential well with electrons located in the top GaN as well as electron from the bottom AlGaN, each of them displaying different decay times due to unequal electric fields. Besides the optical demonstration of a two-dimensional hole gas in a nitride-based heterostructure, our work highlights the optical recombination processes involved in the emission from such a hole gas.

Low-threshold lasing under pulsed optical pumping is demonstrated at room temperature for III-nitride microdisks with InGaN/GaN quantum wells on Si in the blue spectral range. Thresholds in the range of 18 kW/cm2 have been achieved along with narrow linewidths of 0.07 nm and a large peak to background dynamic of 300. We compare this threshold range with the one that can be calculated using a rate equation model. We show that thresholds in the few kW/cm2 range constitute the best that can be achieved with III-nitride quantum wells at room temperature. The sensitivity of lasing on the fabrication process is also discussed.

Ultraviolet microdisk lasers are integrated monolithically into photonic circuits using a III-nitride on silicon platform with gallium nitride (GaN) as the main waveguiding layer. The photonic circuits consist of a microdisk and a pulley waveguide terminated by out-coupling gratings. We measure quality factors up to 3500 under continuous-wave excitation. Lasing is observed from 374 nm to 399 nm under pulsed excitation, achieving low threshold energies of $0.14 ~\text{mJ/cm}^2$ per pulse (threshold peak powers of $35 ~\text{kW/cm}^2$). A large peak to background dynamic of around 200 is observed at the out-coupling grating for small gaps of 50 nm between the disk and waveguide. These devices operate at the limit of what can be achieved with GaN in terms of operation wavelength.

Two-dimensional molybdenum disulfide (MoS$_2$) featuring atomically thin thickness and unique electronic structure with favorable bandgap has been widely recognized as an attractive new material for the development of the next generation of ultra-compact, light-weight optoelectronic components. In parallel, the recently emerged metasurfaces have demonstrated exceptional controllability over electromagnetic field within ultra-compact subwavelength dimension offering an unprecedented approach to improve the performance of optoelectronic devices. In this work, we are proposing an integration of metasurfaces with 2D semiconductor materials to achieve polarization sensitive, fast-response photodetectors. The reported devices are among the most compact hybrid MoS2-gap-plasmon metasurface detectors. Relying on the significant electromagnetic field confinement provided by the metasurfaces to enhance light absorption and to reduce the surface states, which generally limit the photo-generated carriers lifetime, we measured enhanced photocurrent and a fast detection speed. Moreover, the strong optical anisotropy introduced by the metasurfaces is used to efficiently control the polarization sensitivity of the photodetector. This work provides a feasible and effective solution to improve the performance of two-dimensional materials based photodetectors.

The advance in designing arrays of ultrathin two-dimensional optical nano-resonators, known as metasurfaces, is currently enabling a large variety of novel flat optical components. The remarkable control over the electromagnetic fields offered by this technology can be further extended to the active regime in order to manipulate the light characteristics in real-time. In this contribution, we couple the excitonic resonance of atomic thin MoS2 monolayers with gap-surface-plasmon (GSP) metasurfaces, and demonstrate selective enhancement of the exciton-plasmon polariton emissions. We further demonstrate tunable emissions by controlling the charge density at interface through electrically gating in MOS structure. Straddling two very active fields of research, this demonstration of electrically tunable light-emitting metasurfaces enables real-time manipulation of light-matter interactions at the extreme subwavelength dimensions.