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We discuss the effect of the dielectric environment (insulators and metal gates) on electronic transport in two-dimensional (2D) transition metal dichalcogenides (TMD) monolayers. We employ well-known ab initio methods to calculate the low-field carrier mobility in free-standing layers and use the dielectric continuum approximation to extend our study to layers in double-gate structures, including the effects of dielectric screening of the electron-phonon interaction caused by the bottom oxide and the gate insulator, and of scattering with hybrid interface optical-phonon/plasmon excitations (`remote phonon scattering'). We find that the presence of insulators with a high dielectric constant may improve significantly the carrier mobility. However, scattering with the interface hybrid excitations negates this gain and degrades the mobility significantly below its free-standing value. In a double-gate geometry with SiO$_{2}$ as bottom-oxide and various top-gate insulators, we find that the mobility decreases as the top-insulator dielectric constant increases, as expected. However, a high mobility is predicted in the case of the weakly polar hBN, and a mobility much lower than expected is calculated in the case of gate-insulator/TMD/bottom-oxide stacks in which two or more polar materials have optical-phonon with similar resonating frequencies. We also find that the effect of screening by metal gates is noticeable but not particularly strong. Finally, we discuss the effect of the TMD dielectric constant, of the free-carrier density, and of temperature on the transport properties of TMD monolayers., Comment: 22 pages, 13 figures

Over the last few years, $ab~initio$ methods have become an increasingly popular tool to evaluate intrinsic carrier transport properties in 2D materials. The lack of experimental information, and the progress made in the development of DFT tools to evaluate electronic band structures, phonon dispersions, and electron-phonon scattering matrix-elements, have made them a favored choice. However, a large discrepancy is observed in the literature among the $ab~initio$ calculated carrier mobility in 2D materials. Some of the discrepancies are a result of the physical approximations made in calculating the electron-phonon coupling constants and the carrier mobility. These approximations can be avoided by using a sophisticated transport model. However, despite using appropriate transport models, the uncertainty in the reported carrier mobility is still quite large in some materials. The major differences observed between these refined model calculations are the `flavors' of DFT (exchange-correlation functional, pseudopotential, and the effect of spin-orbit coupling) used. Here, considering several monolayer 2H-TMDs as examples, we calculate the low- and high-field transport properties using different `flavors' of DFT, and calculate a range for the electron mobility values. We observe that in some materials the values differ by orders of magnitude (For example, in monolayer WS$_{2}$ the electron low-field mobility varies between 37 cm$^{2}$/(V$\cdot$s) and 767 cm$^{2}$/(V$\cdot$s)). We analyze critically these discrepancies, and try to understand the limitations of the current $ab~initio$ methods in calculating carrier transport properties.