1. Investigation on the Effects of Copper Electroplating Process
- Author
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Shi Qing Chen, Xiuhan Li, Haixia Zhang, and Yue Chen
- Subjects
Core (optical fiber) ,Materials science ,chemistry ,Electrical resistivity and conductivity ,Metallurgy ,Copper plating ,Cluster (physics) ,chemistry.chemical_element ,Current (fluid) ,Electroplating ,Current density ,Copper - Abstract
This paper mainly discusses DC electroplating process parameter, especially the current density, affects the electroplating result (such as copper grain, surface smooth, resistivity). A positive relationship has been found between the current density and the electrodepositing speed, copper grain diameter, core cluster as well as square resistivity. Furthermore, testing structures are designed to monitor the process on line. And an observation of fluctuation along the transection has been found which is also increased with the current density.Copyright © 2008 by ASME
- Published
- 2008
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