1. Efficient Passivation and Low Resistivity for p+-Si/TiO2 Contact by Atomic Layer Deposition
- Author
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Thomas P. White, Naeimeh Mozaffari, Kylie R. Catchpole, Yueliang Li, Klaus Weber, Daniel A. Jacobs, Daniel Hiller, Heping Shen, Hieu T. Nguyen, Pheng Phang, Ute Kaiser, Yanting Yin, and Gunther G. Andersson
- Subjects
010302 applied physics ,Passivation ,business.industry ,Energy Engineering and Power Technology ,02 engineering and technology ,021001 nanoscience & nanotechnology ,01 natural sciences ,7. Clean energy ,Engineering physics ,Renewable energy ,Atomic layer deposition ,13. Climate action ,Photovoltaics ,Research council ,Political science ,0103 physical sciences ,Materials Chemistry ,Electrochemistry ,Chemical Engineering (miscellaneous) ,Electrical and Electronic Engineering ,0210 nano-technology ,business - Abstract
We acknowledge the support of the Australian Renewable Energy Agency (ARENA), the Australian Centre for Advanced Photovoltaics (ACAP), and the ANFF ACT Node in carrying out this research. H.T.N. acknowledges the fellowship support of the Australian Centre for Advanced Photovoltaics. T.P.W. is the recipient of an Australian Research Council Future Fellowship (Project No. FT180100302) funded by the Australian Government.
- Published
- 2020
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