1. Reducing the adhesion between surfaces using surface structuring with PS latex particle
- Author
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Jérôme Dejeu, Michaël Gauthier, Mikhael Bechelany, Johann Michler, Laetitia Philippe, Patrick Rougeot, Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174) (FEMTO-ST), Université de Technologie de Belfort-Montbeliard (UTBM)-Ecole Nationale Supérieure de Mécanique et des Microtechniques (ENSMM)-Université de Franche-Comté (UFC), Université Bourgogne Franche-Comté [COMUE] (UBFC)-Université Bourgogne Franche-Comté [COMUE] (UBFC)-Centre National de la Recherche Scientifique (CNRS), Swiss Federal Laboratories for Materials Testing and Research, and Swiss Federal Laboratories for Materials Science and Technology [Thun] (EMPA)
- Subjects
Materials science ,Latex ,Surface Properties ,miromanipulation ,PS latex particles ,Nanotechnology ,02 engineering and technology ,Electron ,010402 general chemistry ,Microscopy, Atomic Force ,01 natural sciences ,symbols.namesake ,Micromanipulation ,adhesion force ,Monolayer ,Microscopy ,Materials Testing ,Surface structuring ,General Materials Science ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,Composite material ,Particle Size ,Range (particle radiation) ,Models, Statistical ,pull-off force ,Adhesiveness ,Radius ,Adhesion ,021001 nanoscience & nanotechnology ,0104 chemical sciences ,symbols ,Microscopy, Electron, Scanning ,Polystyrenes ,Particle size ,Stress, Mechanical ,van der Waals force ,0210 nano-technology - Abstract
International audience; The adhesion between a micro-object and a microgripper end-effector is an important problem in micromanipulation. Canceling or reducing this force is a great challenge. This force is directly linked to the surface chemical structure of the object and the gripper. We propose to reduce the adhesion force by using a self-assembled monolayer structuring on one surface. The surface was structured by polystyrene latex particles (PS particles) with radii from 100 to 1500 nm. The adhesion force measurements obtained by AFM were compared to a multisphere van der Waals force model. The model suggests the existence of an optimal value of the sphere radius which minimizes the adhesion. In that case, the pull-off force is reduced to 20 nN by the PS particles layer with a radius of 45 nm. A wide range of applications in the field of telecommunications, bioengineering, and more generally speaking, MEMS can be envisaged for these substrates.
- Published
- 2010
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