1. Electrical and Structural Properties of the Partial Ternary Thin-Film System Ni–Si–B
- Author
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Mitsuaki Nishio, Nam Nguyen, Alfred Ludwig, Matthias Wambach, S. Hamann, Toyohiro Chikyow, and Shinjiro Yagyu
- Subjects
Silicon ,Electrode material ,Molecular Structure ,Surface Properties ,010405 organic chemistry ,Chemistry ,Electric Conductivity ,General Chemistry ,General Medicine ,010402 general chemistry ,01 natural sciences ,0104 chemical sciences ,Small Molecule Libraries ,Structure-Activity Relationship ,Chemical engineering ,Nickel ,Sputtering ,Combinatorial Chemistry Techniques ,Work function ,Thin film ,Ternary operation ,Boron - Abstract
High-throughput and combinatorial materials science methods were used to investigate the dependence of the work function in the Ni–Si system on the B content (0–30 at. %). Alloying of NiSi is used to adapt its properties to suit the needs as a gate electrode material. Thin-film materials libraries were fabricated and investigated with respect to their structural and electrical properties. Further the work function values of selected samples in the region of interest were analyzed. The results show that the work function can be adjusted between 4.86 eV (B = 4.2 at. %) and 5.16 eV (B = 29.2 at. %) for (NiSi)Bx.
- Published
- 2019
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