1. The Influence of Electric Parameters on Film Quality of GZO Thin Film Fabricated by APPJ Process
- Author
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Shih Cheng Chang, Jui Mei Hsu, Chih Chiang Weng, Kai Chieh Chiang, and Yao-Yang Tsai
- Subjects
Materials science ,Atmospheric pressure ,business.industry ,General Engineering ,Analytical chemistry ,Atmospheric-pressure plasma ,Plasma ,Pulse (physics) ,Optoelectronics ,Vacuum chamber ,Thin film ,business ,Sheet resistance ,Voltage - Abstract
In this paper, APPJ (Atmospheric pressure Pules arc Plasma Jet) is used to generate a DC pulse source depositing GZO thin film under atmospheric pressure. Thus, no vacuum chamber needed leads to the cost downward. With scanning operation, makes single unit area into large size area. Several key process parameters have been studied, including the power supply voltage, DC pulse, the length of the nozzle extended head, and depositing gap to understand their relationship with the film quality and atmospheric plasma state.In this study, with adjusting DC pulse, the pulse frequency is found to have a great impact on the plasma state and the film quality. When the pulse frequency is near 25 kHz, lower sheet resistance can be retained. Besides, adjusting Tofftime, the plasma and thin film quality are influenced more than Tontime. By changing the power supply voltage, the secondary-side voltage decreases with increasing of the instantaneous current; moreover, the plasma will become more intense.
- Published
- 2015