1. Drain current characteristics of Silicon Nanowire Field-Effect Transistors (SNWFETs) with SiO2, ZrO2 and HfO2 as dielectric materials.
- Author
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Abdulrazak, Tijjani, Bhoomeeswaran, H., Galadanci, G. S. M., and Darma, T. H.
- Subjects
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DIELECTRIC materials , *SILICON nanowires , *FIELD-effect transistors , *PERMITTIVITY , *SEMICONDUCTOR technology - Abstract
Silicon Nanowire Field-Effect Transistors (SNWFETs) have emerged as promising candidates for advanced electronic devices due to their excellent electrostatic control, high carrier mobility, and scalability. The idea of the work is to investigate the drain current characteristics of SNWFETs by employing some selected dielectric materials, namely SiO2, ZrO2, and HfO2, to understand their impact on device performance. The electrical characteristic of these devices is systematically analyzed through extensive measurements, focusing on drain current behavior under different biasing conditions. The influence of SiO2, ZrO2, and HfO2 dielectrics on key performance metrics, such as subthreshold swing, on/off current ratio, and trans-conductor, is thoroughly investigate. Furthermore, the study explores the potential of ZrO2, and HfO2 as alternative dielectric materials to SiO2 for SNWFETS, considering their high dielectric constants and ability to provide effective gate control. The findings of this research shows that a 0.88 gate control parameter of SNWFET at room temperature can be made to perform better by using ZrO2, and HfO2 dielectric layer. Additionally, the room temperature of SNWFET with ZrO2 dielectric material has a higher drain current of 10.2 mA at a higher gate voltage of 0.6 volts when compared to other temperature curves. The presented results underscore the importance of the dielectric material selection in tailoring the electrical properties of SNWFETs for specific applications, paving the way for advancements in semiconductor technology. [ABSTRACT FROM AUTHOR]
- Published
- 2024
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