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The application of microsecond pulsed Grimm glow discharge atomic emission spectrometry for depth profiling of thin films is examined. The effects of pulsed conditions including pulse voltage, pulse frequency, pulse width, and Ar pressure on depth profiling performance were characterized for Zn and Cu coatings on steel. Using optimized conditions, linear calibration curves of coating thickness for Zn (6.1-26.9 μm) and Cu (50-500 nm) on steel were achieved. A precision of 2-5% relative standard deviation was determined. An ultrathin coating of Cu (10 nm) on steel was also measured by this technique.

A Grimm-type glow discharge ion source, operated in the microsecond pulsed mode, has been interfaced to a commercial time-of-flight mass spectrometer. Ion transport from the source to the mass spectrometer, an inherent limitation of a Grimm source and mass spectrometer combination, was evaluated. The primary discharge operating conditions found to influence transport efficiency were gas flow rate and source pressure. The configuration of the Grimm-type source also influenced ion transport, including use of a gas-directing sleeve device. The effect of transport efficiency was separated into two components: (1) total ion signal and (2) temporal resolution. The latter is an advantage afforded by use of a pulsed glow discharge source and time-of-flight spectrometer, which allows discrimination against interfering gaseous background ions by appropriate ion sampling time. Shown as an example is the identification of trace magnesium from potential background interference using an optimized source configuration based on this temporal resolution method.

Pulsing the glow discharge offers new experiments and applications with a well-established technique.