1. Growth of ultra-flat ultra-thin alkali antimonide photocathode films
- Author
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W. G. Stam, M. Gaowei, E. M. Echeverria, Kenneth Evans-Lutterodt, Jean Jordan-Sweet, T. Juffmann, S. Karkare, J. Maxson, S. J. van der Molen, C. Pennington, P. Saha, J. Smedley, and R. M. Tromp
- Subjects
Biotechnology ,TP248.13-248.65 ,Physics ,QC1-999 - Abstract
Ultra-flat, ultra-thin alkali antimonide photocathodes with high crystallinity can exhibit high quantum efficiency and low mean transverse energy of outgoing electrons, which are essential requirements for a variety of applications for photocathode materials. Here, we investigate the growth of Cs3Sb on graphene-coated 4H–SiC (Gr/4H–SiC), 3C–SiC, and Si3N4 substrates. Sb is deposited using pulsed laser deposition, while Cs is deposited thermally and simultaneously. We demonstrate, employing x-ray analysis and quantum efficiency measurements, that this growth method yields atomically smooth Cs3Sb photocathodes with a high quantum efficiency (>10%), even in the ultra-thin limit (
- Published
- 2024
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