1. Deep UV laser induced fluorescence in fluoride thin films
- Author
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Joerg Heber, Norbert Kaiser, Norbert Danz, Roland Thielsch, Wolfgang Triebel, C. Mühlig, and Publica
- Subjects
Materials science ,cerium emission ,MgF/sub 2 ,time-resolved measurements ,Analytical chemistry ,dielectric thin films ,chemistry.chemical_element ,interference effects ,AlF/sub 3 ,multilayer stacks ,law.invention ,193 nm ,law ,General Materials Science ,hydrocarbons ,high-reflective UV mirrors ,Emission spectrum ,Thin film ,Laser-induced fluorescence ,Absorption (electromagnetic radiation) ,deep UV laser induced fluorescence ,linear absorption process ,LaF/sub 3 ,General Chemistry ,Laser ,multilayer emission spectra ,Fluorescence ,Cerium ,ArF excimer laser irradiation ,chemistry ,fluoride thin films ,energy density dependent measurements ,Luminescence - Abstract
Fluorescence experiments have been performed to study the interaction of 193-nm laser radiation with dielectric thin films of LaF/sub 3/, AlF/sub 3/, and MgF/sub 2/. Spectral- and time-resolved measurements reveal the presence of cerium in LaF/sub 3/ and the influence of hydrocarbons in MgF/sub 2/ and LaF/sub 3/. Virtually no fluorescence response is observable in the case of AlF/sub 3/. Supplementary measurements on multilayer stacks confirm the contribution of hydrocarbon and cerium emission in high-reflective UV mirrors upon ArF excimer laser irradiation. Energy density dependent measurements indicate a linear absorption process as the origin of UV laser induced fluorescence in LaF/sub 3/. Luminescence calculations are applied as a helpful tool in order to account for interference effects that are inherently to be found in the multilayer emission spectra.
- Published
- 2003
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