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We developed a donor doping technique for β-Ga2O3 by using Si-ion (Si+) implantation. For the implanted Ga2O3 substrates with Si+=1×1019–5×1019 cm-3, a high activation efficiency of above 60% was obtained after annealing in a nitrogen gas atmosphere at a relatively low temperature of 900–1000 °C. Annealed Ti/Au electrodes fabricated on the implanted Ga2O3 layers showed ohmic behavior. The Ga2O3 with Si+=5×1019 cm-3 showed the lowest specific contact resistance and resistivity obtained in this work of 4.6×10-6 Ω·cm2 and 1.4 mΩ·cm, respectively. [ABSTRACT FROM AUTHOR]

N-type Ga2O3 homoepitaxial thick films were grown on β-Ga2O3(010) substrates by ozone molecular beam epitaxy. The epitaxial growth rate was increased by more than ten times by changing from the (100) plane to the (010) plane. The carrier concentration of the epitaxial layers could be varied within the range of 1016–1019 cm-3 by changing the Sn doping concentration. Platinum Schottky barrier diodes (SBDs) on 1.4-µm-thick β-Ga2O3 homoepitaxial layers were demonstrated for the first time. The SBDs exhibited a reverse breakdown voltage of 100 V, an on-resistance of 2 mΩ cm2, and a forward voltage of 1.7 V (at 200 A/cm2). [ABSTRACT FROM AUTHOR]