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We present a Ge/MoS2 van der Waals heterojunction photodetector with a short active region constructed using a transfer process. The device exhibits broadband, self-powered, superior device performance within the visible to infrared wavelength (500–1700 nm) operated in a photovoltaic mode. Intriguingly, a sharp increased gain of 10 556 (93) with a varied breakdown voltage of −8.02 V (−6.25 V) under the 700 nm (1550 nm) laser illumination was observed, which was interpreted as the synergistic effect of both soft and avalanche breakdown behavior. These results imply disposable high-sensitivity broadband light-detection potentials with a simple Ge/MoS2 heterojunction, exempting it from the complex and strict construction requirement of conventional avalanche photodetectors. [ABSTRACT FROM AUTHOR]

We demonstrated that ternary HfAlO2 amorphous film prepared with common co-sputtering technology can be a suitable gate dielectric for bilayer MoTe2 transistors. The film quality can be improved by optimizing the sputtering process and post-annealing treatment, which is superior to its binary Al2O3 and HfO2 components and satisfies gate dielectric criteria. The bilayer MoTe2 transistors with ∼29-nm-thick HfAlO2 gate dielectric exhibit an Ion/Ioff ratio of over 108 by a low operating voltage, together with a small subthreshold swing ≈ 71.22 mV/dec. These promising characteristics favor the development of high-performance and low-power ultrathin MoTe2-based beyond-silicon electronics. [ABSTRACT FROM AUTHOR]