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The optical and electrical characteristics of InGaN blue and green micro-light-emitting diodes (μLEDs) with GaN tunnel junction (TJ) contacts grown by metalorganic chemical vapor deposition (MOCVD) were compared at different activation temperatures among three activation methods from the literature, namely, sidewall activation, selective area growth (SAG), and chemical treatment before sidewall activation. The devices with chemical treatment before activation resulted in uniform electroluminescence and higher light output power, compared to the devices with sidewall activation and SAG. Moreover, the green μLEDs showed greater optical degradation at elevated activation temperatures, whereas the blue μLEDs yielded trivial difference with activation temperatures from 670 to 790 °C. The 5 × 5 μm2 devices with chemical treatment before activation and SAG yielded almost identical voltage at 20 A/cm2, and the voltage penalty significantly decreased with activation temperature in the case of devices with sidewall activation. The devices with chemical treatment before activation resulted in higher external quantum efficiency (EQE) and wall-plug efficiency (WPE) in low current density range compared to the devices with SAG. The enhancements in EQE and WPE were observed in different μLED sizes, suggesting that chemical treatment before sidewall activation enables the use of TJ contacts grown by MOCVD and is advantageous for applications that require high brightness and efficiency.

We report on a simple, controllable chemical doping method to fabricate a lateral homogeneous MoS2 tunnel diode. MoS2 was doped to degenerate n- (1.6 × 1013 cm−2) and p-type (1.1 × 1013 cm−2) by benzyl viologen and AuCl3, respectively. The n- and p-doping can be patterned on the same MoS2 flake, and the high doping concentration can be maintained by Al2O3 masking together with vacuum annealing. A forward rectifying p-n diode and a band-to-band tunneling induced backward rectifying diode were realized by modulating the doping concentration of both the n- and p-sides. Our approach is a universal stratagem to fabricate diverse 2D homogeneous diodes with various functions.

The dynamic characteristics of III-nitride multi-quantum well laser diodes (LDs) emitting at 410 nm were investigated. LDs were grown on semipolar (202¯1¯) bulk GaN substrates and fabricated into devices with cavity lengths ranging from 900 nm to 1800 nm. A 3-dB bandwidth of 5 GHz and 5 Gbit/s direct modulation with on-off keying were demonstrated, which were limited by the bandwidth of the photodetector used for the measurements. The differential gain of the LDs was determined to be 2.5 ± 0.5 × 10−16 cm2 by comparing the slope efficiency for different cavity lengths. Analysis of the frequency response showed that the K-factor, the gain compression factor, and the intrinsic maximum bandwidth were 0.33 ns, 7.4 × 10−17 cm3, and 27 GHz, respectively.

Experiments were conducted to measure the performance of direct-current-pulsed electrohydrodynamic drop formation as a function of liquid viscosity, electrical conductivity, and surface tension. While hydrodynamic and charge relaxation times and Taylor cone formation frequencies suggest theoretical drop-generation frequencies well in excess of 100 Hz, we show that it is impossible to produce more than 50 drops per second with performance decreasing as viscosity increased or electrical conductivity decreased (and not a significant function of surface tension). Instead of relying on relaxation-time calculations to predict the maximum, reliable drop-production frequency, a dimensionless coefficient that is a function of viscosity and electrical conductivity is proposed to estimate the fulcrum frequency.