1. Effect of growth stoichiometry on the electrical activity of screw dislocations in GaN films grown by molecular-beam epitaxy
- Author
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L. N. Pfeiffer, Michael J. Manfra, Cheng-Hsuan Chen, S. N. G. Chu, Richard J. Molnar, and Julia W. P. Hsu
- Subjects
Crystallography ,Physics and Astronomy (miscellaneous) ,Transmission electron microscopy ,Wide-bandgap semiconductor ,Analytical chemistry ,Electrical measurements ,Dislocation ,Epitaxy ,Stoichiometry ,Molecular beam epitaxy ,Leakage (electronics) - Abstract
The impact of the Ga/N ratio on the structure and electrical activity of threading dislocations in GaN films grown by molecular-beam epitaxy is reported. Electrical measurements performed on samples grown under Ga-rich conditions show three orders of magnitude higher reverse bias leakage compared with those grown under Ga-lean conditions. Transmission electron microscopy (TEM) studies reveal excess Ga at the surface termination of pure screw dislocations accompanied by a change in the screw dislocation core structure in Ga-rich films. The correlation of transport and TEM results indicates that dislocation electrical activity depends sensitively on dislocation type and growth stoichiometry.
- Published
- 2001
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