Search

An electro-absorption optical modulator concept based upon a dual-graphene layer is presented. The device consists of a silicon-on-insulator waveguide upon which two graphene layers reside, separated by a thin insulating region. The lower graphene acts as a tunable absorber, while the upper layer functions as a transparent gate electrode. Calculations based upon realistic graphene material properties show that 3-dB bandwidths over 120 GHz (30 GHz) are achievable at near- (λ = 1.55 μm) and mid- (λ = 3.5 μm) infrared bands. The effect of background doping and potential fluctuations on the bandwidth, modulation depth, and insertion loss are also quantified. [ABSTRACT FROM AUTHOR]

A graphene wireless sensor concept is described. By utilizing thin gate dielectrics, the capacitance in a metal-insulator-graphene structure varies with charge concentration through the quantum capacitance effect. Simulations using realistic structural and transport parameters predict quality factors, Q, >60 at 1 GHz. When placed in series with an ideal inductor, a resonant frequency tuning ratio of 25% (54%) is predicted for sense charge densities ranging from 0.32 to 1.6 μC/cm2 at an equivalent oxide thickness of 2.0 nm (0.5 nm). The resonant frequency has a temperature sensitivity, df/dT, less than 0.025%/K for sense charge densities >0.32 μC/cm2. [ABSTRACT FROM AUTHOR]

Sulfur passivation of Ge(100) is achieved using aqueous ammonium sulfide (NH4)2S(aq). The passivation layer is largely preserved after atomic layer deposition of the high-κ dielectric material HfO2 when sufficiently low growth temperatures (e.g., 220 °C) are employed. Oxygen incorporation is moderate and results in an electrically passivating GeOS interface layer. The HfO2/GeOS/Ge gate stack exhibits lower fixed charge and interface state density than a more conventional HfO2/GeON/Ge gate stack fabricated via an ammonia gas treatment. [ABSTRACT FROM AUTHOR]

Growing a thick high-quality epitaxial layer on the β-Ga2O3 substrate is crucial in commercializing β-Ga2O3 devices. Metal organic chemical vapor deposition (MOCVD) is also well-established for the large-scale commercial growth of β-Ga2O3 and related heterostructures. This paper presents a systematic study of the Schottky barrier diodes fabricated on two different Si-doped homoepitaxial β-Ga2O3 thin films grown on Sn-doped (001) and (010) β-Ga2O3 substrates by MOCVD. X-ray diffraction analysis of the MOCVD-grown sample, room temperature current density–voltage data for different Schottky diodes, and C–V measurements are presented. Diode characteristics, such as ideality factor, barrier height, specific on-resistance, and breakdown voltage, are studied. Temperature dependence (170–360 K) of the ideality factor, barrier height, and Poole–Frenkel reverse leakage mechanism are also analyzed from the J–V–T characteristics of the fabricated Schottky diodes. [ABSTRACT FROM AUTHOR]

This work reports the quantification of rise in channel temperature due to self-heating in two-terminal SrSnO3 thin film devices under electrical bias. Using pulsed current–voltage (I–V) measurements, thermal resistances of the thin films were determined by extracting the relationship between the channel temperature and the dissipated power. For a 26-nm-thick n-doped SrSnO3 channel with an area of 200 μm2, a thermal resistance of 260.1 ± 24.5 K mm/W was obtained. For a modest dissipated power of 0.5 W/mm, the channel temperature rose to ∼176 °C, a value which increases further at higher power levels. Electro-thermal simulations were performed which showed close agreement between the simulated and experimental I–V characteristics both in the absence and presence of self-heating. The work presented is critical for the development of perovskite-based high-power electronic devices. [ABSTRACT FROM AUTHOR]

To fully utilize graphene's remarkable optical properties for optoelectronic applications, it needs to be integrated in planar photonic systems. Here, we demonstrate integration of graphene on silicon photonic circuits and precise measurement of the optical absorption coefficient in a graphene/waveguide hybrid structure. A method based on Mach-Zehnder interferometry is employed to achieve high measurement precision and consistency, yielding a maximal value of absorption coefficient of 0.2 dB/μm when graphene is located directly on top of the waveguide. The averaged results obtained from a large number of samples agree with theoretical model utilizing the universal ac conductivity in graphene. Our work provides an important guide for the design and optimization of integrated graphene optoelectronic devices. [ABSTRACT FROM AUTHOR]

We report the results of metal contact resistance, RC, to Nd-doped n-type SrSnO3 films grown by radical-based hybrid molecular beam epitaxy. Sc, Mn, Ti, Al, and Cr contact layers were deposited onto heavily doped SrSnO3 thin films. With no annealing, Al and Cr contacts were found to be highly resistive, while Sc, Mn, and Ti were more conductive, with Mn having the lowest RC of 11 ± 3 Ω-mm, immediately after liftoff. After Al2O3 passivation at 200 °C, Sc, Mn, and Ti contacts all showed Ohmic behavior, with Ti contacts having RC = 2.4 ± 0.3 Ω-mm and a resultant sheet resistance, RS, of 1.66 ± 0.07 kΩ/◻. Specific contact resistivity, ρC, values of 0.03, 0.2, and 0.5 mΩ-cm2 were determined for Ti, Sc, and Mn, respectively. Annealing at 300 °C did not result in any significant change in RC. An additional study was performed using Ti-contacts on bi-layer films consisting of a heavily doped cap layer grown on a moderately doped active layer. It was found that the RC (ρC) of Ti metal to the bi-layer films was ∼1 (2) order(s) of magnitude lower than on single-layer controls. Temperature-dependent analysis was used to extract the barrier height and doping effect for annealed Ti contacts. This work is an important step in evaluating SrSnO3 for use in high-performance and transparent electronic applications. [ABSTRACT FROM AUTHOR]

We investigate piezoresistance in lithographically defined silicon nanowires of various cross-sectional aspect ratios. Both <110>- and <100>-oriented nanowires are investigated under <110>-oriented strain. The nanowire thickness is varied from 23 to 45 nm and the nanowire width is varied from 5 to 113 nm. Our data shows piezoresistance in silicon nanowires being a surface induced effect with {110} surfaces inducing a much larger piezoresistance than {100} surfaces. This is consistent with a higher density of surface states on {110} surfaces than on {100} surfaces. Our experimental findings support recent computational work pointing toward surface states being the source of giant piezoresistance in silicon nanowires. [ABSTRACT FROM AUTHOR]

Beta-phase gallium oxide (β-Ga2O3), the most thermally stable phase of Ga2O3, has stimulated great interest in power electronics due to its ultra-wide bandgap (∼4.9 eV) and high breakdown electric field. The relatively low thermal conductivity of β-Ga2O3, however, limits the device performance due to excessive temperature driven by self-heating. Recently, integrating β-Ga2O3 thin films on substrates with high thermal conductivities has been proposed to improve heat rejection and device reliability. In this work, we prepare high-quality single-crystal β-Ga2O3 thin films by mechanical exfoliation of bulk crystals and study their thermal transport properties. Both the anisotropic thermal conductivity of β-Ga2O3 bulk crystals and the thickness-dependent thermal conductivity of β-Ga2O3 thin films are measured using the time-domain thermoreflectance technique. The reduction in the thin-film thermal conductivity, compared to the bulk value, can be well explained by the size effect resulting from the enhanced phonon-boundary scattering when the film thickness decreases. This work not only provides fundamental insight into the thermal transport mechanisms for high-quality β-Ga2O3 thin films but also facilitates the design and optimization of β-Ga2O3-based electronic devices. [ABSTRACT FROM AUTHOR]

Phosphorene, the 2D analogue of black phosphorus, is a promising material for studying spin transport due to its low spin-orbit coupling and its 1/2 nuclear spin, which could allow the study of hyperfine effects. In this work, the properties of permalloy (Py) and cobalt (Co) contacts to fewlayer phosphorene are presented. The Schottky barrier height was extracted and determined as a function of gate bias. Flat-band barrier heights, relative to the valence band edge, of 110 meV and 200 meV were determined for Py and Co, respectively. These results are important for future studies of spin transport in phosphorene. [ABSTRACT FROM AUTHOR]

Graphene field effect transistors and capacitors that employ ultra-thin atomic layer deposited high-κ TiO2 dielectrics are demonstrated. Of the three TiO2 gate insulation schemes employed, the sequentially deposited HfO2:TiO2 gate insulator stack enabled the reduction of equivalent oxide thickness while simultaneously providing an ultra-thin gate insulation layer that minimized gate leakage current. The multilayer gate insulation scheme demonstrates a means for advanced device scaling in graphene-based devices. [ABSTRACT FROM AUTHOR]

SnSe2 field-effect transistors fabricated using mechanical exfoliation are reported. Substrate-gated devices with source-to-drain spacing of 0.5 μm have been fabricated with drive current of 160 μA/μm at T = 300 K. The transconductance at a drain-to-source voltage of Vds = 2 V increases from 0.94 μS/μm at 300 K to 4.0 μS/μm at 4.4 K, while the field-effect mobility increases from 8.6 cm2/Vs at 300 K to 28 cm2/Vs at 77 K. The conductance at Vds = 50 mV shows an activation energy of only 5.5 meV, indicating the absence of a significant Schottky barrier at the source and drain contacts. [ABSTRACT FROM AUTHOR]