4 results on '"Tuominen, Marko"'
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2. Electrical and materials properties of ZrO2 gate dielectrics grown by atomic layer chemical vapor deposition
3. Atomic-layer-deposited WN[sub x]C[sub y] thin films as diffusion barrier for copper metallization.
4. Electrical and materials properties of ZrO[sub 2] gate dielectrics grown by atomic layer chemical vapor deposition.
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