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Start Over Author "Wang, Changshun" Journal applied physics letters
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5. Area-selective deposition of self-assembled monolayers on SiO2/Si(100) patterns.

Author

Wang, Changshun, Pan, Xu, Sun, Cunying, and Urisu, Tsuneo

Subjects
*MONOMOLECULAR films, *SILICON oxide films, *CRYSTAL etching, *INFRARED spectroscopy, *ELLIPSOMETRY, *CONTACT angle, *SYNCHROTRON radiation
Abstract

Area-selective deposition of self-assembled monolayers (SAMs) has been demonstrated on patterns of SiO2/Si(100). The pattern was fabricated by synchrotron radiation stimulated etching of SiO2 thin films on Si substrate. Several kinds of the patterns were obtained with different types of masks. A dodecene SAM was deposited on Si surface and an octadecyltrichlorosilane SAM was deposited on SiO2 surface. The deposited SAMs were densely packed and well ordered characterized by infrared spectroscopy, ellipsometry, and water contact angle measurements. [ABSTRACT FROM AUTHOR]

Published
2006
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