1. Characterization and thermal shock behavior of Y2O3 films deposited on freestanding CVD diamond substrates.
- Author
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Hua, Chenyi, Guo, Jianchao, Liu, Jinglong, Yan, Xiongbo, Zhao, Yun, Chen, Liangxian, Wei, Junjun, Hei, Lifu, and Li, Chengming
- Subjects
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THERMAL shock , *YTTRIUM oxides , *SUBSTRATES (Materials science) , *CHEMICAL vapor deposition , *THIN film deposition , *ANTIREFLECTIVE coatings , *MAGNETRON sputtering - Abstract
Y 2 O 3 anti-reflection films were deposited on freestanding CVD diamond substrates by radio frequency magnetron sputtering. The thermal shock resistance and oxidation resistance of Y 2 O 3 /diamond/Y 2 O 3 samples at 727 °C and 800 °C in atmospheric air were investigated. No delamination of the Y 2 O 3 films occurred after thermal shock, thereby demonstrating extreme adhesion to freestanding diamond substrates. After thermal shock, Y atoms in the films were almost fully oxidized. Moreover, the majority of monoclinic phase in the Y 2 O 3 films transformed into cubic phase, crystallinity was enhanced, and the average grain size significantly increased. The maximum transmittance in the 8–12 μm long-wave IR range of the Y 2 O 3 /diamond/Y 2 O 3 samples increased from 81.3% ± 0.3% to 84.7% ± 0.2% and 83.6% ± 0.4%. These findings indicated that the Y 2 O 3 anti-reflection films displayed good resistance to thermal shock and provided sufficient protection for diamond substrates against elevated temperature oxidation. [ABSTRACT FROM AUTHOR]
- Published
- 2016
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