12 results on '"Hwang, Cheol Seong"'
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2. Atomic layer deposition of Ta-doped SnO2 films with enhanced dopant distribution for thermally stable capacitor electrode applications
3. Theoretical understanding of the catalyst-free growth mechanism of GaAs B nanowires
4. Interface sulfur passivation using H2S annealing for atomic-layer-deposited Al2O3 films on an ultrathin-body In0.53Ga0.47As-on-insulator
5. Effect of crystalline structure of TiO2 substrates on initial growth of atomic layer deposited Ru thin films
6. Erratum to “Theoretical understanding of the catalyst-free growth mechanism of GaAs “1 1 1”B nanowires” [Appl. Surf. Sci. 496 (2019) 143740]
7. Theoretical understanding of the catalyst-free growth mechanism of GaAs <111>B nanowires
8. Improved interface properties of atomic-layer-deposited HfO2 film on InP using interface sulfur passivation with H2S pre-deposition annealing
9. Interface sulfur passivation using H 2 S annealing for atomic-layer-deposited Al 2 O 3 films on an ultrathin-body In 0.53 Ga 0.47 As-on-insulator
10. Chemical structures and electrical properties of atomic layer deposited HfO2 thin films grown at an extremely low temperature (≤100°C) using O3 as an oxygen source
11. Chemical structures and electrical properties of atomic layer deposited HfO2 thin films grown at an extremely low temperature (≤100°C) using O3 as an oxygen source.
12. Effect of crystalline structure of TiO2 substrates on initial growth of atomic layer deposited Ru thin films
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