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2. Characteristics of High Aspect Ratio SiO2 Etching Using C4H2F6 Isomers

3. Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide

6. Enhanced interfacial contact between PbS and TiO2 layers in quantum dot solar cells using 2D-arrayed TiO2 hemisphere nanostructures.

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