1. Scalable growth of atomically thin MoS2 layers in a conventional MOCVD system using molybdenum dichloride dioxide as the molybdenum source.
- Author
-
Yang, Xu, Li, Shisheng, Ikeda, Naoki, Ohtake, Akihiro, and Sakuma, Yoshiki
- Subjects
- *
MOLYBDENUM , *CHEMICAL vapor deposition , *TRANSITION metals , *DISCONTINUOUS precipitation , *VAPOR pressure - Abstract
[Display omitted] • A carbon-free inorganic precursor, MoO 2 Cl 2 , as the molybdenum source for atomically thin MoS 2 growth was pioneeringly identified. • Uniquely, MoO 2 Cl 2 is available for integration with the standard well-controlled MOCVD system. • Using MoO 2 Cl 2 and H 2 S as the molybdenum and sulfur sources, respectively, in a standard MOCVD set-up ensures a highly reproducible growth process and eliminates the carbon contamination existing in typical MOCVD-grown MoS 2. • Carbon-free monolayer MoS 2 films were successfully grown with decent quality and wafer-scale homogeneity. To bring atomically thin transition metal dichalcogenides (TMDs) to practical application, a highly reproducible process to grow them over a large scale is indispensable. Here, we develop a carbon-free reproducible route for the scalable growth of high-quality monolayer MoS 2 by selecting molybdenum dichloride dioxide (MoO 2 Cl 2) as the Mo source and integrating the precursor with a standard low-pressure cold-wall metalorganic chemical vapor deposition (MOCVD) system. Specifically, combined with H 2 S as the sulfur source and using catalytic Dragontrail glass (DT-glass) as the main substrate, we investigate the effect of MoO 2 Cl 2 flux, temperature, and deposition time on the growth, confirming MoO 2 Cl 2 with reasonably high vapor pressure is well compatible with the MOCVD system that enables precise control of sources for uniform nucleation and growth of MoS 2 over a large area. We successfully demonstrate the growth of carbon-free MoS 2 monolayers on DT-glass with decent crystalline, optical, and electrical properties. Additionally, the initial attempts also manifest that the proposed strategy could be generalized for growing ultrathin MoS 2 on other technologically important substrates, such as SiO 2 /Si and quartz, exhibiting superior optical quality and wafer-scale uniformity. This work provides a new avenue for the large-scale production of high-quality MoS 2 monolayers and facilitates their use in practical applications. [ABSTRACT FROM AUTHOR]
- Published
- 2023
- Full Text
- View/download PDF