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Start Over Author "McNeill, David" Journal applied surface science
3 results on '"McNeill, David"'

3. High temperature thermal stability of the HfO2/Ge (100) interface as a function of surface preparation studied by synchrotron radiation core level photoemission.

Author

Chellappan, Rajesh Kumar, Gajula, Durga Rao, McNeill, David, and Hughes, Greg

Subjects
*HIGH temperatures, *THERMAL stability, *HAFNIUM oxide, *GERMANIUM compounds, *SURFACE preparation, *SYNCHROTRON radiation, *DIELECTRICS, *PHOTOELECTRON spectroscopy
Abstract

Highlights: [•] Interface formation of ALD HfO2 on both HF and sulphur treated germanium surface and the thermal stability was studied using SXPS. [•] The interfacial sulphur component was stable upto 500°C annealing treatment. [•] Interfacial oxides were effectively removed after post deposition anneal at 700°C without affecting dielectric stoichiometry. [•] The band offsets were determined using photoemission spectroscopy measurement for the dielectric-semiconductor structure. [ABSTRACT FROM AUTHOR]

Published
2014
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