1. Is 1-hexene epoxidation in TS-1 diffusion limited in different solvents?
- Author
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Ramachandran, Chen E., Zhao, Qi, Zikanova, Arlette, Kocirik, Milan, Broadbelt, Linda J., and Snurr, Randall Q.
- Subjects
- *
SOLUTION (Chemistry) , *SEPARATION (Technology) , *SOLID solutions , *ALCOHOLS (Chemical class) - Abstract
Abstract: PFG NMR diffusion measurements were carried out to determine the effect of solvent on intracrystalline reactant diffusivities and on 1-hexene epoxidation rates in TS-1 catalyst. Using n-hexane in silicalite as a mimic for the TS-1 system, the self-diffusivity of n-hexane in silicalite was found to be 24% higher in methanol solvent than in acetonitrile solvent and 45% higher than in acetone solvent. The presence of trace Al did not affect n-hexane diffusivity. Based on analysis of the Weisz modulus for a slab morphology, the 1-hexene epoxidation reaction in TS-1 was found to be diffusion limited only if the crystal size is at least 38μm in the methanol system. [Copyright &y& Elsevier]
- Published
- 2006
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