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Reference 1 Hayat A., Sohail M., Taha T.A., Alenad A.M., Uddin I., Hayat A., Ali T., Shah R., Irfan A., Khan W.U. A superficial intramolecular alignment of carbon nitride through conjugated monomer for optimized photocatalytic CO2 reduction. However, the morphology did not sustain after adding the TDP monomer (change from nanosheets to irregular, rough surface nanoparticles). A Superficial Intramolecular Alignment of Carbon Nitride through Conjugated Monomer for Optimized Photocatalytic CO 2 Reduction. [Extracted from the article]

One of the most frequent ways to widen the adsorption range of carbon nitride (CN) is to add a well-known photosensitizer into its basic structure. So far, such attachments have been accomplished by using weak van der Waals forces. However, using strong covalent bonding to attach such photosensitizer with CN is yet to be determined. Here, for the first time, we covalently bonded porphyrin (5,10,15,20-tetrakis(4-(2,4-diamino-1,3,5-triazinyl) phenyl)-Porphyrin (TDP)), a renowned photosensitizer, effectively with CN by thermally balanced molecular strategy. A photoreaction system was set up for the deoxygenated conversion of CO2 to CO under visible light, where cobalt acted as a redox controller to speed up the charge transportation, while CN-TDP worked as a CO2 activating photocatalyst. The subsequent photocatalyst has a broader absorbance range, a greater specific surface area, and intramolecular organic connections that help to decrease the electron-hole pairs' recombination rate. Furthermore, the average weight ratio between urea and TDP was well-tuned, resulting in a fantastic CO2 photoconversion for CN-TDP7.0 compared to the blank sample. This substantial increase in photocatalytic activity predicts a significant shift in CN's specific surface area, band gap, chemical composition, and structure, as well as the efficient separation of photogenerated charge carriers from the ground state (HOMO) to the excited state (LUMO), making it a top candidate for CO2 photoreduction. At the same time, this approach paves the path for the bottom-up fabrication of carbon nitride nanosheets. [ABSTRACT FROM AUTHOR]