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Tungsten oxide WO3 thin films are deposited by DC reactive magnetron sputtering. The Reactive Gas Pulsing Process (RGPP) associated with the GLancing Angle Deposition method (GLAD) are implemented to produce zigzag columnar structures. The oxygen injection time (tON time) and the pulsing period are kept constant. Three tilt angles α are used: 75, 80, and 85° and the number of zigzags N is progressively changed from N = 0.5, 1, 2, 4, 8 to 16. For each film, refractive index, extinction coefficient, and absorption coefficient are calculated from optical transmission spectra of the films measured in the visible region from wavelength values only. Absorption and extinction coefficients monotonously drop as the number of zigzags increases. Refractive indices are the lowest for the most grazing tilt angle α = 85°. The highest refractive index is nevertheless obtained for a number of zigzags close to four. This optimized optical property is directly correlated to changes of the microstructure, especially a porous architecture, which is favored for high tilt angles, and tunable as a function of the number of zigzags.